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首页> 外文会议>14th International Conference on Vacuum WEB Coating, 14th, Oct 25-27, 2000, Reno, Nevada >Promising potentialities of EB deposition processes
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Promising potentialities of EB deposition processes

机译：EB沉积工艺潜力无限

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摘要

In recent years, the importance of PVD technologies for the improvement of surface properties regarding different substrates has increased. In the field of large area coating, Electron Beam (EB) PVD technologies have conquered various applications. Industrial plants for optical coatings, such as reflection increasing layer systems or other functional coatings on strips are well established. The high deposition rates of EB-PVD open up new possibilities to profitable solutions for special coating tasks. The use of ion assisted EB-PVD leads to improved layer properties compared to conventional EB deposition. In this paper the deposition of alloys and compounds by EB-PVD will be considered by the example of silver-tin-alloy coating and titanium oxide coating. Experimental arrangements and results of the deposition processes are presented. Aspects of industrial application of these techniques are discussed.
机译：近年来，PVD技术对于改善有关不同基材的表面性能的重要性日益提高。在大面积涂层领域，电子束（EB）PVD技术已经征服了各种应用。用于光学涂层（例如反射增加层系统或带材上的其他功能涂层）的工业设备已经建立。 EB-PVD的高沉积速率为特殊涂层任务的获利解决方案开辟了新的可能性。与传统的EB沉积相比，离子辅助EB-PVD的使用可改善层的性能。在本文中，将以银锡合金涂层和氧化钛涂层为例，考虑通过EB-PVD沉积合金和化合物。介绍了沉积过程的实验安排和结果。讨论了这些技术在工业上的应用。

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