Deposition of carbonic films from plasma of arc discharge without a cathode spot

机译：在没有阴极斑点的情况下从电弧放电等离子体沉积碳膜

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PVD ways of synthesis of hydrogen-free diamond-like films with high speed of a deposition of particles are analyzed. The technique of obtaining of coatings by means of a vacuum - arc discharge and of a plasma-optical filter provide the highest characteristics of - C amorphous diamond. However, the given way of synthesis is unwieldy and requires considerable costs. The capability of creation of the reactor of carbonic plasma in discharge with electron-beam heating of the cathode is consider. The control of power, entered into the graphitic cathode, allows essentially to limit a dispersion of an evaporated material.

机译：分析了PVD合成高速无氢类金刚石薄膜的方法。通过真空电弧放电和等离子滤光片获得涂层的技术提供了-C无定形金刚石的最高特性。但是，给定的合成方法笨重且需要大量成本。考虑在阴极的电子束加热下在放电中产生碳等离子体反应器的能力。进入石墨阴极的功率控制基本上可以限制蒸发材料的分散。

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来源
《17th International Conference on Photoelectronics and Night Vision Devices May 27-31, 2002 Moscow, Russia》|2002年|p.424-426|共3页
会议地点 Moscow(RU)
作者
I.Gasanov; I.Gurbanov;
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作者单位

Institute of Photoelectronics of the Azerbaijan NAS, Baku;

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原文格式 PDF
正文语种 eng
中图分类一般工业技术;
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机译：脉冲电压和沉积时间对混合阴极电弧-辉光放电等离子体辅助化学气相沉积沉积在可弯曲不锈钢箔上梯度金属/碳膜粘附强度的影响。
2. Graded metal carbon protein binding films prepared by hybrid cathodic arc - Glow discharge plasma assisted chemical vapor deposition [J] . Jamesh Mohammed Ibrahim, Boxman R. L., Nosworthy Neil J., Surface & Coatings Technology . 2015,第Null期

机译：混合阴极电弧-辉光放电等离子体辅助化学气相沉积法制备的梯度金属碳蛋白结合膜。
3. Evaluation of corrosion resistance and cytocompatibility of graded metal carbon film on Ti and NiTi prepared by hybrid cathodic arc/glow discharge plasma-assisted chemical vapor deposition [J] . Jamesh Mohammed Ibrahim, Li Penghui, Bilek Marcela M. M., Corrosion science . 2015,第auga期

机译：阴极电弧/辉光放电等离子体辅助化学气相沉积法制备Ti和NiTi梯度金属碳膜的耐蚀性和细胞相容性的评价
4. Deposition of carbonic films from plasma of arc discharge without a cathode spot [C] . I.Gasanov, I.Gurbanov, SPIE-The International Society for Optical Engineering International conference on photoelectronics and night vision devices . 2003

机译：从电弧放电等离子体沉积碳胶片，没有阴极点
5. Design of atmospheric pressure plasma CVD process for deposition of silicon nitride thin films using dielectric barrier discharge. [D] . Hu, Shunfu. 2008

机译：大气压等离子体CVD工艺的设计，该工艺使用介电势垒放电沉积氮化硅薄膜。
6. High Quality Graphene Thin Films Synthesized by Glow Discharge Method in A Chemical Vapor Deposition System Using Solid Carbon Source [O] . Le Wang, Jie Sun, Weiling Guo, 2020

机译：固体碳源化学气相沉积系统中辉光放电法合成的高质量石墨烯薄膜
7. Electrical properties of a-C: Mo films produced by dual-cathode filtered cathodic arc plasma deposition [O] . Sakon Sansongsiri, André Anders, Banchob Yotsombat 2008

机译：A-C：由双阴极滤波的阴极电弧等离子体沉积产生的Mo膜的电气性能

Deposition of carbonic films from plasma of arc discharge without a cathode spot

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