Formation and Characterization of NiYb Silicides

机译：NiYb硅化物的形成与表征

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We have studied the silicidation of nickel (Ni)-ytterbium (Yb) films deposited from sputtering target of Ni alloyed with Yb. We have conducted structural, electrical, and optical characterizations of the deposited films. Our results indicated the formation and properties of NiYb silicides were related to the Yb addition to Ni and the annealing conditions.

机译：我们已经研究了从与Yb合金化的Ni的溅射靶上沉积的镍（Ni）-y（Yb）膜的硅化作用。我们已经对沉积膜进行了结构，电气和光学表征。我们的结果表明，NiYb硅化物的形成和性质与Ni中添加Yb和退火条件有关。

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来源
《2011 International conference on semiconductor technology for ultra large scale integrated circuits and thin film transistors (ULSIC vs. TFT)》|2011年|p.199-204|共6页
会议地点 Hong Kong(HK);Hong Kong(HK)
作者
Y. Yuan; E. Ivanov;
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作者单位

Tosoh SMD Inc, Grove City, Ohio 43123, USA;

Tosoh SMD Inc, Grove City, Ohio 43123, USA;

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原文格式 PDF
正文语种 eng
中图分类大规模集成电路、超大规模集成电路;
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Formation and Characterization of NiYb Silicides

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