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Thermal effusion measurements: Probing hydrogen in surface passivation schemes

机译:热渗流测量:在表面钝化方案中探测氢

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Hydrogen is a vital component of surface passivation materials because it can diffuse towards the silicon interface and passivate surface and bulk defects during thermal treatment. To gain more insight into these complex processes, thermal effusion measurements are an innovative and technologically-relevant approach. During these experiments, thin films are heated under high vacuum conditions while the gaseous species released from bulk and surface are detected by a mass spectrometer. The temperature range (T= 200–1000°C) includes the range for activation of the surface passivation (typically, T= 350–500°C), but also the higher temperature range (T > 700°C) typically used during the metallization processes of solar cells. As case studies, we consider Al2O3 and Al2O3:Er films. In addition, the effusion of inert gas atoms—implanted in the Al2O3 films— is discussed as a sensitive, complementary approach to study gas diffusion during annealing. We demonstrate that effusion measurements reveal significant differences in hydrogen diffusion and hydrogen loss for films with a range of structural properties. These results were consistently correlated with the thermal stability of the surface passivation.
机译:氢是表面钝化材料的重要组成部分,因为它可以在热处理过程中向硅界面扩散并钝化表面和整体缺陷。为了更深入地了解这些复杂的过程,热渗流测量是一种创新且与技术相关的方法。在这些实验中,在高真空条件下加热薄膜,而从散装物和表面释放的气态物质则通过质谱仪进行检测。温度范围(T = 200–1000°C)包括激活表面钝化的范围(通常,T = 350–500°C),而且还包括表面活化期间通常使用的较高温度范围(T> 700°C)。太阳能电池的金属化过程。作为案例研究,我们考虑了Al2O3和Al2O3:Er膜。此外,将惰性气体原子的渗入(注入到Al2O3薄膜中)作为研究退火过程中气体扩散的灵敏的补充方法进行了讨论。我们证明了渗出测量揭示了具有一系列结构特性的薄膜的氢扩散和氢损失的显着差异。这些结果与表面钝化的热稳定性一致。

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