(Ag,Li)NbO3 thin films fabricated on (001), (110), and (111)SrTiO3 substrates by pulsed laser deposition

机译：通过脉冲激光沉积在（001），（110）和（111）SrTiO3衬底上制备（Ag，Li）NbO3薄膜

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001-, 110-, 111-oriented (Ag1−xLix)NbO3 (ALN) films with x=0.05 (ALN05), 0.1 (ALN10), and 0.15 (ALN15) were fabricated on (001), (110) and (111) SrTiO3 (STO) substrates by pulse laser deposition (PLD). The surface texture of the ALN films ware dependent on the crystal orientation of STO substrates. All the ALN films exhibited a ferroelectric behavior. The ALN films with x=0.1 deposited on (111) STO showed the largest remanent polarization of 40µC/cm².

机译：在（001），（110）和（111）上制作了x = 0.05（ALN05），0.1（ALN10）和0.15（ALN15）的001、110、111取向（Ag1-xLix）NbO3（ALN）膜。）SrTiO3（STO）基板通过脉冲激光沉积（PLD）。 ALN膜的表面纹理取决于STO基板的晶体取向。所有的ALN膜都表现出铁电行为。在（111）STO上沉积的x = 0.1的ALN膜显示出最大的剩余极化强度40µC / cm ^{2 。}

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来源
《2013 IEEE International Symposium on the Applications of Ferroelectric and Workshop on the Piezoresponse Force Microscopy》|2013年|127-129|共3页
会议地点 Prague(CZ)
作者
Yamamoto Yu; Fujii Ichiro; Wada Takahiro;
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作者单位

Department of Materials Chemistry, Ryukoku University, Otsu 520-2194, Japan;

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会议组织
原文格式 PDF
正文语种 eng
中图分类
关键词
(Ag,Li)NbO3; AgNbO3; LiNbO3; PLD; pulsed laser deposition; thin film;

机译：（Ag，Li）NbO3; AgNbO3; LiNbO3; PLD;脉冲激光沉积;薄膜;;

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专利

1. Ferroelectric and antiferroelectric properties of AgNbO3 films fabricated on (001), (110), and (111)SrTiO3 substrates by pulsed laser deposition [J] . Hiroyuki Sakurai Seiji Yamazoe and Takahiro Wada Applied Physics Letteres . 2010,第4期

机译：通过脉冲激光沉积在（001），（110）和（111）SrTiO3衬底上制备的AgNbO3薄膜的铁电和反铁电特性
2. Ferroelectric and antiferroelectric properties of AgNbO_3 films fabricated on (001), (110), and (111)SrTiO_3 substrates by pulsed laser deposition [J] . Hiroyuki Sakurai, Seiji Yamazoe, Takahiro Wada Applied Physicsletters . 2010,第4期

机译：通过脉冲激光沉积在（001），（110）和（111）SrTiO_3衬底上制备的AgNbO_3薄膜的铁电和反铁电特性
3. Fabrication of (K,Na)NbO3 films on SrRuO3/(001)SrTiO3 substrates by pulsed laser deposition [J] . Fujii Ichiro, Tagata Saori, Nakao Tomohiro, Japanese journal of applied physics . 2015,第10S期

机译：通过脉冲激光沉积在SrRuO3 /（001）SrTiO3衬底上制备（K，Na）NbO3膜
4. (Ag,Li)NbO_3 thin films fabricated on (001), (110), and (111)SrTiO_3 substrates by pulsed laser deposition [C] . Yu Yamamoto, Ichiro Fujii, Takahiro Wada IEEE International Symposium on Applications of Ferroelectrics . 2013

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(Ag,Li)NbO3 thin films fabricated on (001), (110), and (111)SrTiO3 substrates by pulsed laser deposition

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