首页> 外文会议>2013 IEEE International Symposium on the Applications of Ferroelectric and Workshop on the Piezoresponse Force Microscopy >Forming a regular domain structures at 127#x00B0; Y#x2032;-cut of a LiTaO3 crystal by using direct e-beam writing
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Forming a regular domain structures at 127#x00B0; Y#x2032;-cut of a LiTaO3 crystal by using direct e-beam writing

机译:通过直接电子束写入在LiTaO3晶体的127°Y'切割处形成规则的畴结构

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Regular domain structures were formed at the 127° Y′-cut of a LiTaO3 crystal by direct e-beam writing. The study of regular domain structures was carried out by selective chemical etching method and by nonlinear optics methods. The domain lines consists of single triangular domains merged together (base-to-apex). The domain distribution inside the LiTaO3 127° Y′-cut occurs at the angle 37° to the irradiated surface and exhibits a distinct anisotropy in the crystallographic directions. Depending on the direction of e-beam movement along the irradiated surface, the threshold density of the introduced charge necessary for the inversion of the crystal spontaneous polarization changes by an order of magnitude.
机译:通过直接电子束写入,在LiTaO3晶体的127°Y'切口处形成规则的畴结构。通过选择性化学刻蚀方法和非线性光学方法对规则畴结构进行了研究。域线由合并在一起的单个三角形域组成(基到顶点)。 LiTaO3 127°Y'-cut内部的畴分布出现在与辐照表面成37°角的位置,并且在晶体学方向上表现出明显的各向异性。根据电子束沿被照射表面的移动方向,晶体自发极化反转所需的引入电荷的阈值密度会发生一个数量级的变化。

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