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Performance evaluation and read stability enhancement of SRAM bit-cell in 16nm CMOS

机译:16nm CMOS中SRAM位单元的性能评估和读取稳定性增强

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Read stability is one of the most important factors for designing efficient SRAM cell. This research presents in-depth understanding of 6T-SRAM cell's functionality and comparative performance study of the bit-cell under three different technology nodes of 32nm, 22nm and 16nm. Measures are taken to mitigate the effect of drastic reduction in Read-Static-Noise-Margin at 16nm CMOS technology by implementing the 8T-SRAM structure. To design a SRAM cell, in the present research, read and hold stability are taken into consideration. Then static noise margins are estimated for hold and read operations by meticulously selecting the cell-parameters. The cell ratio has highly impacted on the operation of the memory cell. Temperature dependence is also analyzed for 6T and 8T cell at 16nm technology. HSPICE simulation software is employed and a set of transistors incorporating high-k/metal gate from PTM high performance models are used in this research.
机译:读取稳定性是设计高效SRAM单元的最重要因素之一。这项研究提供了对6T-SRAM单元功能的深入了解,以及在32nm,22nm和16nm三种不同技术节点下对位单元的比较性能研究。通过实施8T-SRAM结构,采取了一些措施来减轻16nm CMOS技术上的静态静噪裕度大幅降低的影响。为了设计SRAM单元,在本研究中,考虑了读取和保持稳定性。然后,通过精心选择单元参数来估算保持和读取操作的静态噪声容限。单元比率对存储单元的操作有很大影响。还对16nm技术下的6T和8T电池的温度依赖性进行了分析。本研究使用HSPICE仿真软件,并使用了一组结合了PTM高性能模型中的高k /金属栅极的晶体管。

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