Fast 3D Figuring of Large Optical Surfaces Using Reactive Atom Plasma (RAP) Processing

机译：使用反应性原子等离子体（RAP）处理的大型光学表面的快速3D加工

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This paper presents an investigation into the capability of reactive atom plasma (RAP) processing for figuring of large optical surfaces. Following identification and optimization of the main processing parameters, 500 nanometre deep spherical surfaces were etched into a 200×200mm fused silica substrate. The RAP processing time was optimised down to a12 minute duration whilst achieving surface figure error of 31 nm RMS.

机译：本文介绍了对反应原子等离子体（RAP）处理大光学表面的能力的研究。在确定并优化了主要加工参数后，将500纳米深的球形表面蚀刻到200×200mm熔融石英基板中。优化了RAP处理时间，直到12分钟，同时实现了31 nm RMS的表面图形误差。

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来源
《2nd EOS conference on manufacturing of optical components 2011》|2011年|p.39-40|共2页
会议地点 Munich(DE);Munich(DE)
作者
R. Jourdain; M. Castelli; P. Morantz; P. Shore;
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Cranfield University Precision Engineering, Cranfield, MK43 0AL, United Kingdom;

Cranfield University Precision Engineering, Cranfield, MK43 0AL, United Kingdom;

Cranfield University Precision Engineering, Cranfield, MK43 0AL, United Kingdom;

Cranfield University Precision Engineering, Cranfield, MK43 0AL, United Kingdom;

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原文格式 PDF
正文语种 eng
中图分类光学仪器;
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Fast 3D Figuring of Large Optical Surfaces Using Reactive Atom Plasma (RAP) Processing

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