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首页> 外文会议>2nd International EUSPEN Conference on Precision Engineering Nanotechnology Vol.1, May 27th-31st, 2001, Turin, Italy >High Resolution Probe System for CMM
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High Resolution Probe System for CMM

机译：坐标测量机的高分辨率测头系统

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摘要

We proposed the probe system for CMM, which consisted of elastic hinges, QPD and ball lens to detect the small displacement of stylus. The contact force increases rather than other probes; touch trigger probe etc., we try to totally reduce the contact force by the more sensitive detector. In our concept, as the stylus of this probe is supported by the elastic hinge rigidly, the probe system should detect the displacement of the stylus before the stylus make the plastic deformation on workpiece. Up to now, we had built the probe system supported by disc hinge, which had the cross groove. In the experiment about this probe system, we got the resolution of 5nm and the contact force of 2.1 μm. However, the resolutions in X-axis and Y-axis were different from that of the other directions. In order to improve this problem, we replace the hinge with the cross groove with the disc plate. In this paper, we will show the resolution of displacement and the contact force of new probe system.
机译：我们提出了一种用于三坐标测量机的测头系统，该系统由弹性铰链，QPD和球镜组成，用于检测测针的小位移。接触力增加，而不是其他探针。接触式触发探针等，我们试图通过更灵敏的检测器完全降低接触力。在我们的概念中，由于该探针的探针由弹性铰链牢固地支撑，因此探针系统应在探针使工件发生塑性变形之前检测出探针的位移。到目前为止，我们已经构建了由具有交叉凹槽的圆盘铰链支撑的探针系统。在关于该探针系统的实验中，我们获得了5nm的分辨率和2.1μm的接触力。但是，X轴和Y轴的分辨率与其他方向的分辨率不同。为了改善这个问题，我们用带盘的十字槽代替了铰链。在本文中，我们将介绍新探针系统的位移分辨率和接触力。

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