International comparison in the field of nanometrology: Pitch of 1D gratings (Nano4)

机译：纳米计量学领域的国际比较：一维光栅的间距（Nano4）

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Twelve participants, all from different countries, participated in a comparison on pitch measurements of 1D gratings which ended in summer 2000. Two holographic gratings with pitches of nominally 290 nm and 700 nm served as standards. The main methods used by the participants were optical diffraction and scanning probe techniques. For the two gratings the resulting comparison reference value, which was calculated as the weighted mean of all measurements, has a combined standard uncertainty of only 1.1 pm and 2.3 pm, respectively. All but two of 29 results were in good agreement with the reference value.

机译：来自不同国家的十二位参与者参加了对一维光栅的间距测量的比较，该测量于2000年夏季结束。两个全息光栅的标称标称波长为290 nm和700 nm。参加者使用的主要方法是光学衍射和扫描探针技术。对于两个光栅，作为所有测量的加权平均值计算得出的比较参考值分别具有仅1.1 pm和2.3 pm的组合标准不确定度。 29个结果中除两个之外的所有结果均与参考值良好吻合。

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《2nd International EUSPEN Conference on Precision Engineering Nanotechnology Vol.1, May 27th-31st, 2001, Turin, Italy》|2001年|p.358-361|共4页
会议地点 Turin(IT)
作者
F. Meli;
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作者单位

Swiss Federal Office of Metrology and Accreditation (metas), Bern-Wabern, Switzerland;

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会议组织
原文格式 PDF
正文语种 eng
中图分类机械、仪表工业;
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International comparison in the field of nanometrology: Pitch of 1D gratings (Nano4)

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