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Modelling of Crystal Growth for Sputtered Layers by Molecular Dynamics

机译:用分子动力学模拟溅射层的晶体生长

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摘要

The authors are working on a simulation tool for sputtered coatings on the basis of molecular dynamics leading to a direct correlation of atomistic indicators with determinable mesoscopic layer characteristics. The aim is to compute the material properties of the layer-substrate system and its behaviour within the coating process. The data derived from the molecular-dynamic simulation process will be used to describe the layer growth process and will be compared with real measurement results. Long-term target is to apply the molecular-dynamic simulation for specific layer engineering.
机译:作者正在研究一种基于分子动力学的溅射镀膜仿真工具,从而导致原子指示剂与可确定的介观层特性直接相关。目的是计算涂层系统中材料的特性及其在涂层过程中的行为。来自分子动力学模拟过程的数据将用于描述层生长过程,并将与实际测量结果进行比较。长期目标是将分子动力学模拟应用于特定的层工程。

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