首页> 外文会议>2nd International EUSPEN Conference on Precision Engineering Nanotechnology Vol.1, May 27th-31st, 2001, Turin, Italy >A New Method for Three-Dimensional Measurement of Surface Profile based on the Focused Image Surface algorithm and Optical Microscope
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A New Method for Three-Dimensional Measurement of Surface Profile based on the Focused Image Surface algorithm and Optical Microscope

机译:基于聚焦图像表面算法和光学显微镜的表面轮廓三维测量新方法

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摘要

Technology of the three dimensional surface profile of various engineering surfaces have been greatly desired, and several surface measurement techniques have been available such as interferometry based measurement, AFM based measurement. In this paper, a new method has been devised for precise and efficient surface measurements using optical microscope and simple vertical scanning stage. The newly developed technique of image analysis called the modified focused image surface method is successfully applied to extract the three dimensional surface profiles from the images captured in the scanning process. In contrast with traditional SFF(shape from focus) method which is only available for objects with high-frequency spatial surface variations, a new method using virtual texture generated by the light illuminating grid mask is independent of frequency spatial surface variation. The developed measurement system has been applied to a MEMS specimen fabricated from photolithography, and the measurement results are compared to that of AFM measurement.
机译:迫切需要各种工程表面的三维表面轮廓技术,并且已经有几种表面测量技术可用,例如基于干涉的测量,基于AFM的测量。在本文中,已经设计了一种新方法,可以使用光学显微镜和简单的垂直扫描台进行精确有效的表面测量。成功开发了一种新的图像分析技术,称为“改进聚焦图像表面方法”,可以从扫描过程中捕获的图像中提取三维表面轮廓。与仅适用于具有高频空间表面变化的对象的传统SFF(聚焦形状)方法相反,使用由光照栅格蒙版生成的虚拟纹理的新方法与频率空间表面变化无关。所开发的测量系统已应用于由光刻技术制成的MEMS标本,并将测量结果与AFM测量进行了比较。

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