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首页> 外文会议>The 3rd International Symposium on Material Chemistry in Nuclear Environment (Material Chemistry '02 MC'02) Mar 13-15, 2002 Tsukuba >PLASMA-POLYMERIZED SiOx DEPOSITION ON POLYMER FILM SURFACES FOR PREPARATION OF OXYGEN GAS BARRIER POLYMERIC FILMS
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PLASMA-POLYMERIZED SiOx DEPOSITION ON POLYMER FILM SURFACES FOR PREPARATION OF OXYGEN GAS BARRIER POLYMERIC FILMS

机译：在聚合物膜表面上进行等离子体聚合的SiOx沉积，以制备氧气阻隔性聚合物膜

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摘要

SiOx films were deposited on surfaces of three polymeric films, PET, PP, and Nylon; and their oxygen gas barrier properties were evaluated. To mitigate discrepancies between the deposited SiOx and polymer film, surface modification of polymer films was done, and how the surface modification could contribute to was discussed from the viewpoint of apparent activation energy for the permeation process. The SiOx deposition on the polymer film surfaces led to a large decrease in the oxygen permeation rate. Modification of polymer film surfaces by mans of the TMOS or Si-COOH coupling treatment in prior to the SiOx deposition was effective in decreasing the oxygen permeation rate. The cavity model is proposed as an oxygen permeation process through the SiOx-deposited Nylon film. From the proposed model, controlling the interface between the deposited SiOx film and the polymer film is emphasized to be a key factor to prepare SiOx-deposited polymer films with good oxygen gas barrier properties.
机译：SiOx膜沉积在三种聚合膜PET，PP和尼龙的表面上；并评估了它们的氧气阻隔性能。为了减轻沉积的SiOx与聚合物膜之间的差异，对聚合物膜进行了表面改性，并从渗透过程中的表观活化能的角度讨论了表面改性如何起作用。 SiO x在聚合物膜表面上的沉积导致氧渗透速率大大降低。在SiOx沉积之前，通过TMOS或Si-COOH偶联处理的方式对聚合物膜表面进行改性对降低氧的渗透速率是有效的。腔模型被提出为通过SiOx沉积的尼龙膜的氧气渗透过程。从提出的模型出发，强调控制沉积的SiOx膜和聚合物膜之间的界面是制备具有良好的氧气阻隔性能的SiOx沉积的聚合物膜的关键因素。

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