INTEGRATED MICROFLUIDIC-MICROOPTICAL DETECTION SYSTEMS FABRICATED BY DRY ETCHING OF SODA-LIME GLASS

机译：钠钙玻璃干刻法制造的集成微流控微光检测系统

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In this paper, a method of fabrication of a microfiuidic system, integrated with fluorescence detection optics, is presented. Soda-lime glass is used as a substrate material, in which the waveguiding optics is fabricated by means of an ion exchange process, whereas the microfiuidic channel is manufactured utilising reactive ion etching technique. Basic optical characteristics of the device are also reported.

机译：在本文中，提出了一种与荧光检测光学器件集成的微流体系统的制造方法。钠钙玻璃用作衬底材料，其中波导光学器件是通过离子交换工艺制造的，而微流体通道是利用反应性离子蚀刻技术制造的。还报告了该设备的基本光学特性。

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来源
《4th International Conference on Nanochannels, Microchannels and Minichannels 2006(ICNMM2006) pt.B》|2006年|P.1025-1029|共5页
会议地点 Limerick(IE)
作者
Radoslaw Mazurczyk; Julien Vieillard; Lynda-Lawrence Bourn; Aude Bouchard; Yann Chevolot; Pierre Cremillieu; Benjamin Hannes; Stanislas Krawczyk;
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作者单位

Laboratoire d'Electronique, Optoelectronique et Microsystemes, Ecole Centrale de Lyon, Ecully, France;

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原文格式 PDF
正文语种 eng
中图分类特种结构材料;
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专利

1. Integrated microfluidic-microoptical systems fabricated by dry etching of soda-lime glass [J] . Julien Vieillard, Radoslaw Mazurczyk, Lynda-Lawrence Bourn, Microelectronic Engineering . 2008,第2期

机译：通过干蚀刻钠钙玻璃制成的集成微流控微光学系统
2. Dry Etching of GaAs to Fabricate Via-Hole Grounds in Monolithic Microwave Integrated Circuits [J] . D.S. Rawal, V.R. Agarwal, H.S. Sharma, Defence Science Journal . 2009,第4期

机译：GaAs的干法刻蚀以制造单片微波集成电路中的通孔接地
3. Dry Etching of GaAs to Fabricate Via-Hole Grounds in Monolithic Microwave Integrated Circuits [J] . B.K. Sehgal, D.S. Rawal, H.S. Sharma, Defence science journal . 2009,第4期

机译：GaAs的干法刻蚀以制造单片微波集成电路中的通孔接地
4. INTEGRATED MICROFLUIDIC-MICROOPTICAL DETECTION SYSTEMS FABRICATED BY DRY ETCHING OF SODA-LIME GLASS [C] . Radoslaw Mazurczyk, Julien Vieillard, Lynda-Lawrence Bourn, 4th International Conference on Nanochannels, Microchannels and Minichannels 2006(ICNMM2006) pt.B . 2006

机译：钠钙玻璃干刻法制造的集成微流控微光检测系统
5. Dry etching of high aspect ratio silicon microstructures in high density plasma sources for microelectromechanical systems. [D] . Weigold, Jason Weldon. 2000

机译：在微机电系统的高密度等离子体源中干法蚀刻高纵横比的硅微结构。
6. Extreme wettability of nanostructured glass fabricated by non-lithographic anisotropic etching [O] . Eusun Yu, Seul-Cham Kim, Heon Ju Lee, -1

机译：通过非光刻各向异性蚀刻制造的纳米结构玻璃的极高润湿性
7. Miniaturized Capillary Electrophoresis Fabricated on Pyrex Glass Chips Using Deep Dry Etching and Anodic Bonding. [O] . Takanori Ichiki, Yoshinari Sugiyama, Yasuhiro Horiike 2002

机译：使用深蚀刻和阳极粘合在Pyrex玻璃芯片上制造的小型化毛细管电泳。
8. Fracture Strength of Soda-Lime Glass after Etching. [R] . doremus,robert h. pavelchek,edward k. 1974

机译：蚀刻后钠钙玻璃的断裂强度。

INTEGRATED MICROFLUIDIC-MICROOPTICAL DETECTION SYSTEMS FABRICATED BY DRY ETCHING OF SODA-LIME GLASS

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