Key Laboratory of Advanced Display and System Applications,Ministry of Education,Shanghai University,Shanghai 200072,China School of Mechanical Electronic Engineering and Automation,ShanghaiUniversity,Shanghai 200072,China;
Key Laboratory of Advanced Display and System Applications,Ministry of Education,Shanghai University,Shanghai 200072,China;
Key Laboratory of Advanced Display and System Applications,Ministry of Education,Shanghai University,Shanghai 200072,China School of Mechanical Electronic Engineering and Automation,ShanghaiUniversity,Shanghai 200072,China;
机译:磁控溅射在聚合物基底上室温沉积柔性透明导电掺杂Ga的ZnO薄膜
机译:通过射频磁控溅射在聚碳酸酯基板上生长的透明导电Ga掺杂ZnO薄膜
机译:通过脉冲直流磁控溅射以不同的溅射功率和衬底温度沉积的Ga掺杂ZnO薄膜及其性能改善潜力
机译:基质温度对RF磁控溅射重型Ga掺杂ZnO透明导电膜性能的影响
机译:氢退火和衬底温度对射频溅射氧化锌薄膜性能的影响
机译:射频直流和射频叠加直流磁控溅射沉积的透明导电掺铝ZnO多晶薄膜的载流子输运和晶体学取向特征
机译:错误:“磁控溅射靶侵蚀区域对透明导电ZnO多晶膜结构和电学空间分布的影响”J。苹果。物理。 124,065304(2018)