THE APPLICATION OF ATOMIC FORCE MICROSCOPY TO THE STUDY OD WALL REACTIONS IN HALOGEN LAMPS AND METAL HALIDE DISCHARGE LAMPS

机译：原子力显微镜在卤素灯和金属卤化物放电灯中OD壁反应研究中的应用

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The assessment of the changing envelope topography in an operating lamp is a useful indicator of the processes involved in wall/atmosphere interactions. The use of AFM (Atomic Force Microscopy) has allowed us to make a detailed study of this interface. Use of the Burleigh ARIS 3300 Personal AFM yields resolution of at least 1 nm in the x and y directions and 0.1 nm in the z direction. With resolution at this level extremely subtle changes in wall topography can be detected. Wall degradation can be monitored after very short operation times (minutes) using AFM, thus offering significant reductions in the time necessary to investigate wall reactions compared to other possible diagnostic methods such as light transmission which require lamp operation of thousands of hours.

机译：评估工作灯中包络线的变化是对壁/大气相互作用过程的有用指示。 AFM（原子力显微镜）的使用使我们可以对该接口进行详细的研究。 Burleigh ARIS 3300 Personal AFM的使用在x和y方向上产生至少1 nm的分辨率，在z方向上产生0.1 nm的分辨率。在此级别的分辨率下，可以检测到墙面形貌的极细微变化。使用AFM可以在非常短的操作时间（分钟）后监控壁的退化，因此与其他可能的诊断方法（例如，需要数千小时的灯工作的光传输）相比，可以大大减少调查壁反应所需的时间。

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来源
《The 8th International Symposium on the Science amp; Technology of Light Sources (LS-8), 8th, Aug 31st - Sep 3rd, 1998, Greifswald - Germany》|1998年|p.340-341|共2页
会议地点 Greifswald(DE);Greifswald(DE)
作者
S.P. Oliver; J.C.McGourlay; R. Devonshire;
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High Temperature Science Laboratories, Chemistry Department, University of Sheffield, Sheffield, S3 7HF, UK.;

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正文语种 eng
中图分类电工技术;
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THE APPLICATION OF ATOMIC FORCE MICROSCOPY TO THE STUDY OD WALL REACTIONS IN HALOGEN LAMPS AND METAL HALIDE DISCHARGE LAMPS

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