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Cross-sectional TEM study of surface modification of nano-structure with gas cluster ion beams

机译：气体团簇离子束对纳米结构表面改性的截面TEM研究

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Surface modification effects on patterned surface with gas cluster ion beam (GC1B) were studied by observation with a cross-sectional transmission electron microscope in order to use it for planarization of patterned media such as discrete track media (DTM) or bit-patterned media (BPM) for future hard disk drives. As a model structure of patterned media, line-and-space or bit patterns were fabricated on Si substrates, and subsequently amorphous carbon films were deposited on them. After Ar-GCIB irradiations on amorphous carbon, it was shown that GCIB preferentially removed bumps or crest on the surface of amorphous carbon at normal incidence. The required thickness for planarization was close to the initial peak-to-valley. At an incident angle of 57°, line-and-space patterns became sharp-pointed shape. On the contrary, line-and-space patterns were planarized without tiny asperity formation at 77°. These results indicate that quite effective planarization of patterned surface is possible using GCIB at normal or glancing angle irradiation.
机译：通过使用横截面透射电子显微镜观察研究了用气体团簇离子束（GC1B）对图案化表面的表面改性效果，以将其用于图案化介质的平坦化，例如离散轨道介质（DTM）或位图案化介质（ BPM）以用于将来的硬盘驱动器。作为图案化介质的模型结构，在Si衬底上制作了行距或位图，然后在其上沉积了无定形碳膜。在用Ar-GCIB辐照无定形碳后，结果表明，GCIB在法向入射时优先去除了无定形碳表面上的凸起或波峰。平坦化所需的厚度接近初始峰谷。在57°的入射角处，线和间隔图案变成尖锐的形状。相反，在77°时，线和空间图案被平面化而没有微小的凹凸。这些结果表明，在法向或掠射角辐照下使用GCIB可以对图案化的表面进行非常有效的平面化。

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