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Large area precision optical coatings by pulse magnetron sputtering

机译：脉冲磁控溅射大面积精密光学镀膜

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摘要

Pulse magnetron sputtering is very well suited for the deposition of optical coatings. Due to energetic activation during film growth, sputtered films are dense, smooth and show an excellent environmental stability. Films of materials like SiO_2, A1_2O_3, Nb_2O_5 or Ta_2O_5 can be produced with very little absorption and scattering losses and are well suited for precision optics. FEP's coating plant PreSensLine, a deposition machine dedicated for the development and deposition of precision optical layer systems will be presented. The coating machine (VON ARDENNE) is equipped with dual magnetron systems (type RM by FEP). Concepts regarding machine design, process technology and process control as well as in situ monitoring are presented to realize the high demands on uniformity, accuracy and reproducibility. Results of gradient and multilayer type precision optical coatings are presented. Application examples are edge filters and special antireflective coatings for the backlight of 3D displays with substrate size up to 300 x 400mm. The machine allows deposition of rugate type gradient layers by rotating a rotary table with substrates between two sources of the dual magnetron system. By combination of the precision drive (by LSA) for the substrate movement and a special pulse parameter variation during the deposition process (available with the pulse unit UBS-C2 of FEP), it is possible to adjust the deposition rate as a function of the substrate position exactly. The aim of a current development is a technology for the uniform coating of 3D-substrates and freeform components as well as laterally graded layers.
机译：脉冲磁控溅射非常适合于光学涂层的沉积。由于薄膜生长过程中的能量活化，溅射的薄膜致密，光滑并显示出极好的环境稳定性。诸如SiO_2，Al_2O_3，Nb_2O_5或Ta_2O_5之类的材料薄膜可以产生很小的吸收和散射损耗，非常适合精密光学。将介绍FEP的镀膜厂PreSensLine，这是一款专门用于精密光学层系统的开发和沉积的沉积机。涂布机（VON ARDENNE）配备双磁控管系统（FEP生产的RM型）。提出了有关机械设计，过程技术和过程控制以及原位监控的概念，以实现对均匀性，准确性和可重复性的高要求。给出了梯度和多层型精密光学镀膜的结果。应用示例是边缘滤光片和特殊的抗反射涂层，用于3D显示器的背光，基板尺寸最大为300 x 400mm。该机器通过在双磁控管系统的两个源之间旋转带有基片的旋转台来沉积皱褶型梯度层。通过将用于基板移动的精密驱动器（通过LSA）和沉积过程中的特殊脉冲参数变化（可通过FEP的脉冲单元UBS-C2获得）相结合，可以根据沉积速度来调整沉积速率基材位置准确。当前开发的目的是一种用于均匀涂覆3D基底和自由形式组件以及横向渐变层的技术。

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  • 来源
  • 会议地点 Anaheim(US)
  • 作者

    Peter Frach; Daniel Gloess; Thomas Goschurny; Andy Drescher; Ullrich Hartung; Hagen Bartzsch; Andreas Heisig; Harald Grune; Lothar Leischnig; Steffen Leischnig; Carsten Bundesmann;

  • 作者单位

    Fraunhofer-histitut fur Organische Elektronik, Elektronenstrahl- und Plasmatechnik (FEP), Winterbergstraße 28, 01277 Dresden, Germany;

    Fraunhofer-histitut fur Organische Elektronik, Elektronenstrahl- und Plasmatechnik (FEP), Winterbergstraße 28, 01277 Dresden, Germany;

    Fraunhofer-histitut fur Organische Elektronik, Elektronenstrahl- und Plasmatechnik (FEP), Winterbergstraße 28, 01277 Dresden, Germany;

    Fraunhofer-histitut fur Organische Elektronik, Elektronenstrahl- und Plasmatechnik (FEP), Winterbergstraße 28, 01277 Dresden, Germany;

    Fraunhofer-histitut fur Organische Elektronik, Elektronenstrahl- und Plasmatechnik (FEP), Winterbergstraße 28, 01277 Dresden, Germany;

    Fraunhofer-histitut fur Organische Elektronik, Elektronenstrahl- und Plasmatechnik (FEP), Winterbergstraße 28, 01277 Dresden, Germany;

    VON ARDENNE GmbH, Am Hahnweg 8, 01328 Dresden, Germany;

    VON ARDENNE GmbH, Am Hahnweg 8, 01328 Dresden, Germany;

    LSA GmbH, AuBerer Hofring 1, 09429 Wolkenstein, Germany;

    LSA GmbH, AuBerer Hofring 1, 09429 Wolkenstein, Germany;

    Leibniz-Institut fur Oberflachenmodifizierung e. V., Permoserstr. 15, 04318 Leipzig, Germany;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Optical filters; large area; pulse magnetron sputtering; reactive sputtering; backlight; freeform coating;

    机译：光学滤镜；大面积;脉冲磁控溅射反应溅射背光自由涂层;

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