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Novel solutions for Thin Film Layer Deposition for Organic Materials

机译:用于有机材料的薄膜层沉积的新型解决方案

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Innovative systems for carrier-gas enhanced vapor phase deposition of organic layers offer advanced methods for the precise deposition of complex thin-film layer stacks. The approach inherently avoids potential short-comings from solvent-based polymer deposition and offers new opportunities. The process operates at low pressure (thus avoiding complex vacuum setups), and, by employing AIXTRON's extensive experience in freely scalable solutions, can be adapted to virtually any production process and allows for R&D and production systems alike.rnDeposition of organic layers and stacks recommends the approach for a wide range of organic small molecule and polymer materials (including layers with gradual change of the composition), for conductive layers, for dielectric layers, for barrier systems, for OLED materials, and surface treatments such as oleophobic / hydrophobic coatings.rnWith the combination of other vapor phase deposition solutions, hybrid systems combining organic and inorganic materials and other advanced stacks can be realized.
机译:用于载气增强有机层气相沉积的创新系统提供了用于精确沉积复杂薄膜层堆叠的先进方法。该方法从本质上避免了溶剂型聚合物沉积的潜在缺点,并提供了新的机会。该工艺在低压下运行(因此避免了复杂的真空设置),并且通过利用AIXTRON在自由可扩展解决方案中的丰富经验,几乎可以适用于任何生产工艺,并适用于研发和生产系统。适用于多种有机小分子和聚合物材料(包括组成逐渐变化的层),导电层,介电层,阻挡层系统,OLED材料以及疏油/疏水涂层等表面处理的方法。通过与其他气相沉积解决方案的组合,可以实现将有机和无机材料与其他高级堆叠相结合的混合系统。

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