Metal-dielectric light absorbers manufactured by Ion Plating

机译：通过离子镀制造的金属介电吸光剂

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In order to improve their mechanic and climatic properties, we studied the manufacturing of metal-dielectric light absorbers using an Ion Plating Process. The choice of the materials, Hf for the metal and SiO_2 for the dielectric, allows us of to use the deposition plant for either metal dielectric or all dielectric HfO_2-SiO_2 coatings without any change. After an index characterization of metallic films, we manufactured monochromatic and broad-band coatings. These coatings have been qualified for space environment.

机译：为了提高它们的力学和气候特性，我们研究了使用离子镀工艺制造金属介电吸光剂的过程。材料的选择（金属的Hf和电介质的SiO_2）使我们能够将沉积设备用于金属电介质或所有电介质的HfO_2-SiO_2涂层，而无需进行任何更改。在对金属膜进行折射率表征之后，我们制造了单色和宽带涂层。这些涂料已通过太空环境认证。

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来源
《Advances in Optical Thin Films》|2003年|p.511-518|共8页
会议地点 St. Etienne(FR)
作者
M. Cathelinaud; F. Lemarquis; J. Loesel; B. Cousin;
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作者单位

Institut Fresnel, UMR CNRS 6133, Ecole Nationale Superieure de Physique de Marseille Domaine Universitaire de St Jerome, 13397 Marseille Cedex 20, France;

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会议组织
原文格式 PDF
正文语种 eng
中图分类物理学;
关键词
thin film manufacturing; light absorbers; metallic films; ion plating;

机译：薄膜制造;光吸收剂;金属膜;离子镀;

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4. Metal-dielectric light absorbers manufactured by Ion Plating [C] . M. Cathelinaud, F. Lemarquis, J. Loesel, Society of Photo-Optical Instrumentation Engineers Conference on Advances in Optical Thin Films . 2004

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Metal-dielectric light absorbers manufactured by Ion Plating

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