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EUV and soft X-ray multilayer optics

机译：EUV和软X射线多层光学器件

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The demand to enhance the optical resolution, to structure and observe ever smaller details, has pushed the way towards the EUV and soft X-rays. Induced mainly by the production of more powerful electronic circuits with the aid of projection lithography, optics developments in recent years can be characterized by the use of electromagnetic radiation with smaller wavelength. The good prospects of the EUV and soft X-rays for next generation lithography systems (λ= 13.5 nm), microscopy in the "water window" (λ= 2.3 - 4.4 nm), astronomy (λ= 5 - 31 nm), spectroscopy, plasma diagnostics and EUV/soft X-ray laser research have led to considerable progress in the development of different multilayer optics. Since optical systems in the EUV/soft X-ray spectral region consist of several mirror elements a maximum reflectivity of each multilayer is essential for a high throughput. This paper covers recent results of the enhanced spectral behavior of Mo/Si, Cr/Sc and Sc/Si multilayer optics.
机译：增强光学分辨率，构造和观察更小的细节的需求，已推动了EUV和软X射线的发展。近年来，随着光学技术的发展，其特征主要是借助投影光刻技术生产了功能更强大的电子电路，而电磁辐射的使用波长更短。 EUV和软X射线在下一代光刻系统（λ= 13.5 nm），“水窗”中的显微镜（λ= 2.3-4.4 nm），天文学（λ= 5-31 nm），光谱学方面具有良好的前景，等离子体诊断和EUV /软X射线激光研究已在不同多层光学器件的开发中取得了可观的进步。由于EUV /软X射线光谱区域中的光学系统由几个反射镜元件组成，因此每个多层的最大反射率对于高吞吐量至关重要。本文涵盖了Mo / Si，Cr / Sc和Sc / Si多层光学器件增强光谱特性的最新结果。

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