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Block co-polymer guided self-assembly by surface chemical modification: optimization of multiple patterning process and pattern transfer

机译:通过表面化学改性实现嵌段共聚物引导的自组装:优化多种图案化工艺和图案转移

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摘要

Block co-polymer (BCP) lithography is becoming an established technique for patterning beyond optical lithographylimitations. It is based on combining the intrinsic property of the block co-polymers to phase separate at the molecularscale with the capabil
机译:嵌段共聚物(BCP)光刻技术已成为一种超越光学光刻技术限制的用于构图的成熟技术。它基于将嵌段共聚物的内在特性与分子级相分离的能力相结合

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