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首页> 外文会议>American Society of Mechanical Engineers(ASME) Summer Heat Transfer Conference(HT2005); 20050717-22; San Francisco,CA(UA) >INVESTIGATION OF LIGHTPIPE VOLUMETRIC RADIATION EFFECTS IN RTP THERMOMETRY
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INVESTIGATION OF LIGHTPIPE VOLUMETRIC RADIATION EFFECTS IN RTP THERMOMETRY

机译：RTP测温中光管体积辐射效应的研究

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摘要

A major obstacle to the widespread implementation of Rapid Thermal Processing (RTP) is the challenge of wafer temperature measurement. Frequently, lightpipe radiation thermometers are used to measure wafer temperatures in RTP reactors. While the lightpipe distorts the wafer temperature profile less than temperature measurement techniques which require physical contact, the presence of the lightpipe influences the wafer temperature profile. This paper presents the results of a theoretical study exploring that influence. The coupled radiation/conduction transport in the lightpipe enclosure is solved numerically. Radiation transfer in the system is modeled with varying levels of rigor, ranging from a simple volumetrically non-participating treatment to a full spectral solution of the Radiative Transfer Equation. The results reveal a rather significant effect of the lightpipe on the wafer temperature, which depends on the separation between the lightpipe tip and the wafer. The study illustrates clearly the need to model the lightpipe as a volumetrically participating, semitransparent medium, and further, the importance of accounting for spectral variation of the lightpipe properties in the prediction of the radiative transfer. Finally, two primary mechanisms are identified by which the lightpipe affects the wafer temperature distribution.
机译：快速热处理（RTP）的广泛实施的主要障碍是晶片温度测量的挑战。通常，使用光导管辐射温度计来测量RTP反应器中的晶片温度。虽然光导管比需要物理接触的温度测量技术使晶片温度曲线失真小，但是光导管的存在影响晶片温度曲线。本文介绍了探索该影响的理论研究结果。数值解决了光导管外壳中耦合的辐射/传导传输。系统中的辐射传递具有严格的变化模型，范围从简单的体积非参与处理到辐射传递方程的全光谱解。结果揭示了光导管对晶片温度的相当显着的影响，这取决于光导管尖端与晶片之间的距离。该研究清楚地说明了将光管建模为体积参与的半透明介质的必要性，此外，在预测辐射传递时考虑光管特性的光谱变化的重要性也很重要。最后，确定了两个主要机制，光管通过它们影响晶片温度分布。

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