Laser Damage Growth in Fused Silica with Simultaneous 351 nm and 1053 nm irradiation

机译：351 nm和1053 nm同时照射下熔融石英中的激光损伤生长

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Laser-induced growth of optical damage often determines the useful lifetime of an optic in a high power laser system. We have extended our previous work on growth of laser damage in fused silica with simultaneous 351 nm and 1053 nm laser irradiation by measuring the threshold for growth with various ratios of 351 nm and 1053 nm fluence. Previously we reported that when growth occurs, the growth rate is determined by the total fluence. We now find that the threshold for growth is dependent on both the magnitude of the 351 nm fluence as well as the ratio of the 351 nm fluence to the 1053 nm fluence. Furthermore, the data suggests that under certain conditions the 1053 nm fluence does not contribute to the growth.

机译：激光引起的光学损伤的增长通常决定了高功率激光系统中光学器件的使用寿命。我们通过同时测量351 nm和1053 nm能量密度的各种增长阈值，扩展了先前在351 nm和1053 nm激光同时照射下熔融石英中激光损伤生长的工作。先前我们报道过，当发生增长时，增长率取决于总通量。现在我们发现，增长的阈值既取决于351 nm能量密度的大小，也取决于351 nm能量密度与1053 nm能量密度的比率。此外，数据表明在某些条件下1053 nm的通量对生长没有贡献。

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来源
《Annual Boulder damage symposium;Boulder damage symposium; 20080922-24;20080922-24; Boulder, CO(US);Boulder, CO(US)》|2008年|P.71321H.1-71321H.8|共8页
会议地点 Boulder CO(US);Boulder CO(US)
作者
Mary A. Norton; Adra V. Carr; C. Wren Carr; Eugene E. Donohue; Michael D. Feit; William G.Hollingsworth; Zhi Liao; Raluca A. Negres; Alexander M. Rubenchik; P. J. Wegner;
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Lawrence Livermore National Laboratory, M/S L592, PO Box 5508, Livermore, CA 94551;

Lawrence Livermore National Laboratory, M/S L592, PO Box 5508, Livermore, CA 94551;

Lawrence Livermore National Laboratory, M/S L592, PO Box 5508, Livermore, CA 94551;

Lawre;

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原文格式 PDF
正文语种 eng
中图分类激光技术、微波激射技术;
关键词
laser damage; UV laser damage; laser damage growth; UV fused silica;

机译：激光损伤;紫外激光损伤;激光损伤增长;紫外熔融石英;

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专利

1. Laser-Induced Damage Growth on Larger-Aperture Fused Silica Optical Components at 351 nm [J] . Huang WQ, Han W, Wang F, Chinese physics letters . 2009,第1期

机译：大孔径熔融石英光学元件在351 nm处的激光诱导损伤增长
2. Laser-Induced Damage Growth on Larger-Aperture Fused Silica Optical Components at 351 nm [J] . HUANG Wan-Qing, ZHANG Xiao-Min, HAN Wei, 中国物理快报：英文版 . 2009,第001期

机译：大孔径熔融石英光学元件在351 nm处的激光诱导损伤增长
3. Damage growth characteristics of different initial damage sites of fused silica under 355 nm small laser beam irradiation [J] . Bin Ma, Hongping Ma, Hongfei Jiao, Optics & Laser Technology . 2014,第Null期

机译：355 nm小激光束照射下熔融石英不同初始损伤部位的损伤生长特性
4. Laser Damage Growth in Fused Silica with Simultaneous 351 nm and 1053 nm irradiation [C] . Mary A. Norton, Adra V. Carr, C. Wren Carr, Annual Boulder damage symposium . 2008

机译：熔融二氧化硅激光损伤生长，同时为351nm和1053nm辐照
5. HYDRODYNAMIC EFFICIENCY OF PLANAR TARGETS IRRADIATED BY 351-NM LASER LIGHT (LASER, PLASMA, FUSION, X-RAYS, IONS). [D] . BOEHLY, THOMAS ROBERT. 1985

机译：351海里激光（激光，等离子体，融合，X射线，离子）辐照的平面目标的水动力效率。
6. Observation and analysis of structural changes in fused silica by continuous irradiation with femtosecond laser light having an energy density below the laser-induced damage threshold [O] . Wataru Nomura, Tadashi Kawazoe, Takashi Yatsui, 2014

机译：通过连续照射能量密度低于激光诱发损伤阈值的飞秒激光观察和分析熔融石英的结构变化
7. Effects of deep wet etching in HF/HNO$_3$ and KOH solutions on the laser damage resistance and surface quality of fused silica optics at 351 nm [O] . Pfiffer, Mathilde, Cormont, Philippe, Fargin, Evelyne, 2017

机译：HF / HNO $ _3 $和KOH溶液中的深湿蚀刻对351 nm熔融石英光学元件的抗激光损伤性和表面质量的影响

Laser Damage Growth in Fused Silica with Simultaneous 351 nm and 1053 nm irradiation

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