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首页> 外文会议>Conference on advances in resist materials and processing technology XXVI; 20090223-25; San Jose, CA(US) >Molecular Glass Resists Developable in Supercritical Carbon Dioxide for 193 nm Lithography
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Molecular Glass Resists Developable in Supercritical Carbon Dioxide for 193 nm Lithography

机译：可在超临界二氧化碳中用于193 nm平版印刷的分子玻璃抗蚀剂。

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摘要

In order to meet the growing demand for smaller and higher-performance microelectronic devices, attention has been focused on developing molecular glass photoresists which can be employed under next-generation 193-nm immersion lithography conditions. These amorphous organic compounds produce high-resolution patterns due to their smaller pixel size and lack of chain entanglement compared with polymer photoresists. Specially designed molecular resists have substantial solubilities in supercritical carbon dioxide (scCO_2) which can be altered through acid-catalyzed deprotection reactions. While molecular resists based on phenols have been demonstrated for high-resolution patternability, scCO_2-developable molecular materials have not yet been reported for 193-nm lithography. In this paper, we introduce alicyclic materials based on naturally occurring backbones as chemically amplified molecular resists developable in scCO_2. Methylated β-cyclodextrin and cholic acid derivatives with acid-labile protecting groups form good amorphous thin films with high glass transition temperatures (>100 ℃). These molecules show the capability of being patterned and developed in scCO_2 with resolution below 200 nm.
机译：为了满足对更小和更高性能的微电子器件不断增长的需求，注意力已集中在开发分子玻璃光刻胶上，该光刻胶可在下一代193 nm浸没式光刻条件下使用。与聚合物光致抗蚀剂相比，这些无定形有机化合物由于其较小的像素尺寸和缺乏链缠结而产生高分辨率的图案。经过特殊设计的分子抗蚀剂在超临界二氧化碳（scCO_2）中具有显着的溶解度，可以通过酸催化的脱保护反应进行改变。虽然已经证明了基于酚的分子抗蚀剂具有高分辨率的可图案化性，但尚未报道scCO_2可显影的分子材料用于193 nm光刻。在本文中，我们介绍了基于天然骨架的脂环族材料，作为可在scCO_2中显影的化学放大分子抗蚀剂。具有酸不稳定保护基的甲基化β-环糊精和胆酸衍生物可形成具有高玻璃化转变温度（> 100℃）的良好非晶态薄膜。这些分子显示了在scCO_2中以低于200 nm的分辨率进行图案形成和显影的能力。

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