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首页> 外文会议>Conference on advances in resist materials and processing technology XXVI; 20090223-25; San Jose, CA(US) >Theoretical analysis of development behavior of resist measured by QCM
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Theoretical analysis of development behavior of resist measured by QCM

机译：QCM测量抗蚀剂显影行为的理论分析

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摘要

Quartz-crystal-microbalance (QCM) data were simulated using the characteristic matrix method on a four-layer model. The calculated surfaces of resonance frequency and impedance visualize well their dependencies on the thickness of the dry layer, the thickness and the rigidity of the swelling layer during development. The ideal and swelling dissolutions by the Case II diffusion with high rigidity were analyzed using the same surface of the resonance frequency, which gives visually the condition for the Sauerbrey's relation. The larger thickness of swelling layer and the larger decrease of rigidity during the development show the undulating surfaces of the resonance frequency and impedance, which represent QCM traces with a single-peak, a double-peak or sequential double peaks during the development. The characteristic-matrix analysis has shown the validity of quantitative analysis of QCM data.
机译：使用特征矩阵方法在四层模型上模拟了石英晶体微天平（QCM）数据。共振频率和阻抗的计算表面很好地可视化了它们在显影过程中对干层厚度，溶胀层厚度和刚度的依赖性。使用共振频率相同的表面分析了具有高刚度的Case II扩散产生的理想溶胀和溶胀，这从视觉上给出了Sauerbrey关系的条件。在显影过程中，溶胀层的厚度较大，刚度下降较大，表明共振频率和阻抗呈起伏的表面，代表了显影过程中单峰，双峰或连续双峰的QCM迹线。特征矩阵分析表明了QCM数据定量分析的有效性。

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