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首页> 外文会议>Conference on advances in resist materials and processing technology XXVI; 20090223-25; San Jose, CA(US) >Practical Implementation of Immersion Resist Materials
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Practical Implementation of Immersion Resist Materials

机译：防浸材料的实际实施

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Immersion lithography has gone through its first phase of introduction and acceptance as the main solution for critical layer lithography for 45nm node and beyond. In this phase, the industry has found that immersion technology has its own unique challenges associated with introducing water as a medium between the projection lens and wafer. Resist process qualification is once again under the spot light. Due to the rapid introduction of immersion technology resist suppliers did not have sufficient time to reformulate their standard ArF resist processes to be compatible with water while at the same time satisfying critical imaging, etching and other requirements. For this reason a barrier (topcoat) had to be introduced in order to prevent resist leaching as well as to produce a more desirable surface for water to glide over. Introducing a top-coat created challenges for all parties involved: scanner manufacturers resist vendors and the end users. Since each manufacturer has its own unique technology for introducing immersion water, top-coat/resist processes needed not only to meet the end users' performance criteria but also meet each scanner manufacturer's requirements. Therefore material screening process and process evaluation became an important factor in immersion technology processes. Defectivity became the primary criterion for the resist process. The responsibility of the scanner manufacturer is twofold: first, to produce a system compatible with many different resist processes while not introducing additional defects, and second, to give resist manufacturers clear and concise requirements for achieving performance. In this paper we show how we have met the industry's needs in this area. First, we discuss the importance of material screening, including requirements for hydrophobicity, leaching, and peeling. Second, we present defectivity and other experimental data from practical materials that fulfill all requirements. Cases will be shown wherein an immersion process using commercially available resist processes introduces no additional defects. Several of these now do not require a topcoat. We therefore show that the industry's needs have been met with both topcoat and topcoat-less processes.
机译：浸没式光刻已经经历了其引入和接受的第一阶段，这是45nm及以后的关键层光刻的主要解决方案。在这个阶段，业界发现浸没技术在将水作为介质投射到投影透镜和晶圆之间时面临着自己独特的挑战。抵制工艺资格再次受到关注。由于快速引入了浸没技术，抗蚀剂供应商没有足够的时间来重新制定其标准ArF抗蚀剂工艺以与水兼容，但同时又满足关键的成像，蚀刻和其他要求。因此，必须引入阻挡层（面漆），以防止抗蚀剂浸出并产生更理想的水滑面。引入面漆对所有相关方都带来了挑战：扫描仪制造商抵制供应商和最终用户。由于每个制造商都有自己的独特技术来引入浸泡水，因此面漆/抗蚀剂工艺不仅需要满足最终用户的性能标准，而且还要满足每个扫描仪制造商的要求。因此，材料筛选过程和过程评估成为浸入技术过程中的重要因素。缺陷成为抗蚀剂工艺的主要标准。扫描仪制造商的责任是双重的：首先，生产与许多不同的抗蚀剂工艺兼容的系统，同时又不引入其他缺陷；其次，为抗蚀剂制造商提供清晰，简洁的性能要求。在本文中，我们展示了我们如何满足该领域的行业需求。首先，我们讨论材料筛选的重要性，包括对疏水性，浸出和剥离的要求。其次，我们提供了满足所有要求的实用材料的缺陷率和其他实验数据。将示出其中使用市售抗蚀剂工艺的浸没工艺不会引入额外缺陷的情况。现在，其中一些不需要面漆。因此，我们表明，面漆和无面漆工艺均可满足行业需求。

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