Meso-scale simulation of the polymer dynamics in the formation process of line-edge roughness

机译：线边缘粗糙度形成过程中聚合物动力学的中尺度模拟

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We studied the formation process of the line edge using meso scale simulations based on the dissipative particle dynamics method. The simulation model of the lithographic process is developed in which the dynamics of a polymer chain can be observed. We perform three kinds of simulations; 1) whole area exposure simulation, 2) line pattern simulation, 3) the simulation including the line edge. From our results, a sharp and a homogeneous interface between soluble and insoluble polymers is best solution to LER problem, although its roughness is the size of the chain dimension. The roughened edge can be found in the case of a wide and a homogeneous interface. These results indicate that our simulations can be applicable to study the LER problem and the dynamics of polymer chain will be one of the important origins of LER.

机译：我们使用基于耗散粒子动力学方法的介观尺度模拟研究了线边缘的形成过程。开发了光刻工艺的仿真模型，其中可以观察到聚合物链的动力学。我们执行三种模拟： 1）整个区域曝光模拟，2）线条图案模拟，3）包括线条边缘的模拟。根据我们的结果，可溶和不可溶聚合物之间的尖锐且均匀的界面是解决LER问题的最佳解决方案，尽管其粗糙度是链尺寸的大小。在宽而均匀的界面的情况下可以发现粗糙的边缘。这些结果表明我们的模拟可用于研究LER问题，聚合物链的动力学将是LER的重要来源之一。

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来源
《Conference on advances in resist materials and processing technology XXVI; 20090223-25; San Jose, CA(US)》|2009年|P.727337.1-727337.8|共8页
会议地点 San Jose CA(US)
作者
Hiroshi Morita; Masao Doi;
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作者单位

Nanotechnology Rsearch Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central2-1 1-1-1 Umezono, Tsukuba, Ibaraki, JAPAN, 305-8568;

Dept. of Applied Physics, Univ. Tokyo, 7-3-1, Hongo, Bunkyo, Tokyo, JAPAN, 113-8656;

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原文格式 PDF
正文语种 eng
中图分类材料;
关键词
line edge roughness; dissipative particle dynamics simulation; OCTA; dynamics of polymer chain; surface;

机译：线边缘粗糙度；耗散粒子动力学模拟； OCTA；聚合物链动力学；表面;

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1. Stochastic simulation of thin photoresist film dissolution:a dynamic and a quasi-static dissolution algorithm for the simulation of surface and line-edge roughness formation [J] . G.P.Patsis Polymer: The International Journal for the Science and Technology of Polymers . 2005,第7期

机译：光刻胶薄膜溶解的随机模拟：模拟表面和线条边缘粗糙度形成的动态和准静态溶解算法
2. Effects of model polymer chain architectures and molecular weight of conventional and chemically amplified photoresists on line-edge roughness. Stochastic simulations [J] . George P. Patsis, Evangelos Gogolides Microelectronic Engineering . 2006,第4a9期

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3. Effects of photoresist polymer molecular weight on line-edge roughness and its metrology probed with Monte Carlo simulations [J] . G.P. Patsis, V. Constantoudis, E. Gogolides Microelectronic Engineering . 2004,第3期

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4. Meso-scale simulation of the polymer dynamics in the formationprocess of line-edge roughness [C] . Hiroshi Morita, Masao Doi SPIE Conference on Advances in Resist Materials and Processing Technology . 2009

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Meso-scale simulation of the polymer dynamics in the formation process of line-edge roughness

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