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首页> 外文会议>Conference on Emerging Lithographic Technologies Ⅴ Feb 27-Mar 1, 2001, Santa Clara, USA >Damage Resistant and Low Stress EUV Multilayer Mirrors
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Damage Resistant and Low Stress EUV Multilayer Mirrors

机译：防损坏和低应力EUV多层镜

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摘要

Applications of multilayer mirrors for extreme ultraviolet lithography (EUVL) require not only a high normal incidence reflectivity but also a long lifetime and a minimum residual stress. We focused our interests on a comparative study of two perspective Si-based multilayer systems: Mo/Si and Mc_2C/Si. The mirrors were designed for normal incidence reflection at about 13 nm wavelength. The multilayer mirrors were deposited by dc magnetron sputtering. X-ray scattering, transmission electron microscopy, atomic force microscopy and mechanical stress measurements were used for the characterization of the multilayer structures. Maximum normal incidence reflectivities of 67.5 % @ 13 nm for Mo/Si multilayer mirrors and 66.3 % @ 12.8 nm for Mo2C/Si have been achieved. Investigating the thermal stability of the multilayers in the temperature range from 200℃ to 700℃ it was shown that the reflectivity of Mo/Si mirrors is drastically decreasing after annealing above 300℃, whereas the MozC/Si multilayers show a superior thermal stability up to 600℃. It was found that as-deposited Mo/Si and Mo_2C/Si multilayer mirrors have a similar level of compressive stress of- 520+-20 MPa. The reduction of residual stress in Mo-Si and Mo_2C/Si multilayer systems with post-deposition thermal treatment has been investigated. Using a slow thermal annealing (2℃/min), it is possible to reduce the stress from -520 MPa to nearly zero by heating the Mo-Si specimen up to ～ 310?C. However, it results in a reflectivity drop of ～ 3 % (absolute) at the wavelength of 13 nm. For the Mo_2C/Si system, a stress reduction from -520 MPa to nearly zero is possible by a post annealing at ～ 290℃ without a considerable drop in the reflective properties.
机译：多层反射镜在极紫外光刻（EUVL）中的应用不仅需要高的法向入射反射率，而且还需要较长的使用寿命和最小的残余应力。我们的兴趣集中在对两种基于角度的Si基多层系统的比较研究上：Mo / Si和Mc_2C / Si。这些反射镜设计用于在约13 nm波长的法向入射反射。多层反射镜通过直流磁控溅射沉积。 X射线散射，透射电子显微镜，原子力显微镜和机械应力测量被用于表征多层结构。 Mo / Si多层反射镜的最大法向入射反射率在13 nm处为67.5％，在Mo2C / Si的12.8 nm处达到66.3％@ 12.8 nm。在200℃至700℃的温度范围内对多层膜的热稳定性进行了研究，结果表明，在高于300℃的退火温度下，Mo / Si反射镜的反射率急剧下降，而MozC / Si多层膜在高达300℃的温度下表现出优异的热稳定性。 600℃。发现沉积态的Mo / Si和Mo_2C / Si多层反射镜具有相似水平的-520 + -20MPa的压应力。研究了通过沉积后热处理降低Mo-Si和Mo_2C / Si多层系统中的残余应力。使用缓慢的热退火（2℃/ min），可以通过将Mo-Si试样加热到约310？C将应力从-520 MPa降低到几乎为零。但是，在13 nm波长处反射率下降〜3％（绝对值）。对于Mo_2C / Si系统，通过在290℃下进行后退火，应力可从-520 MPa降低到几乎为零，而反射性能不会显着下降。

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