• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Conference on Emerging Lithographic Technologies Ⅴ Feb 27-Mar 1, 2001, Santa Clara, USA >PREVAIL - EPL Alpha Tool Electron Optics Subsystem
【24h】

PREVAIL - EPL Alpha Tool Electron Optics Subsystem

机译：PREVAIL-EPL Alpha工具电子光学子系统

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

The IBM/Nikon alliance is continuing pursuit of an EPL stepper alpha tool based on the PREVAIL technology. This paper provides a status report of the alliance activity with particular focus on the Electron Optical Subsystem developed at IBM. We have previously reported on design features of the PREVAIL alpha system. The new state-of-the-art e-beam lithography concepts have since been reduced to practice and turned into functional building blocks of a production level lithography tool. The electron optical alpha tool subsystem has been designed, build, assembled and tested at IBM's Semiconductor Research and Development Center (SRDC) in East Fishkill, New York. After demonstrating subsystem functionality, the electron optical column and all associated control electronics hardware and software have been shipped during January 2001 to Nikon's facility in Kumagaya, Japan, for integration into the Nikon commercial e-beam stepper alpha tool. Early pre-shipment results obtained with this electron optical subsystem are presented.
机译：IBM / Nikon联盟正在继续追求基于PREVAIL技术的EPL步进alpha工具。本文提供了联盟活动的状态报告，尤其关注IBM开发的电子光学子系统。我们之前曾报道过PREVAIL alpha系统的设计功能。此后，新的最新电子束光刻概念已付诸实践，并已成为生产级光刻工具的功能构建块。电子光学alpha工具子系统已在位于纽约East Fishkill的IBM半导体研发中心（SRDC）进行了设计，制造，组装和测试。在演示了子系统的功能之后，电子光学柱以及所有相关的控制电子硬件和软件已于2001年1月运送到尼康在日本熊谷市的工厂，以集成到尼康商业电子束步进器阿尔法工具中。介绍了使用此电子光学子系统获得的早期装运结果。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号