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首页> 外文会议>Conference on Emerging Lithographic Technologies VI Pt.1, Mar 5-7, 2002, Santa Clara, USA >Thermal Expansion Behavior of Proposed EUVL Substrate Materials
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Thermal Expansion Behavior of Proposed EUVL Substrate Materials

机译：提议的EUVL基材材料的热膨胀行为

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摘要

The enhanced demands for substrate materials for next-generation optics and masks have initiated detailed investigations on Zerodur~(~R) as a proposed EUVL substrate material. The dependence of thermal expansion of Zerodur~(~R) on process parameters is illustrated herein as well as its utility for EUV substrate material demands. As a result of specifically adjusted process parameters, the coefficient of thermal expansion (CTE) was tailored to be a minimum at 22.5℃. Laboratory samples of Zerodur~(~R) exhibit a CTE corresponding to the lowest expansion class of the SEMI standard P37 (19 to 25℃). By farther variation of process parameters, the position of zero crossing, e.g. at 30℃, can be varied, revealing an attractive attribute feature of Zerodur~(~R). A series of CTE(0;50℃) measurements with a small block of Zerodur~(~R) provides information on CTE homogeneity on a cm-scale: No CTE variation was observed within the error of measurements (5ppb/K) for a block exhibiting +- 2*10~(-6) variation in refractive index A new dilatometer type is in the course of development. First operational results are expected in Summer 2002 with an increased accuracy <2ppb/K in the temperature range of 17 to 30℃.
机译：对于下一代光学器件和掩模的基板材料的需求增加，已经开始对作为建议的EUVL基板材料的Zerodur〜（R）进行详细研究。本文说明了Zerodur _（_ R）的热膨胀对工艺参数的依赖性及其在EUV衬底材料需求方面的效用。由于专门调整了工艺参数，因此将热膨胀系数（CTE）调整为在22.5℃时为最小值。 Zerodur〜（〜R）的实验室样品的CTE对应于SEMI标准P37的最低膨胀等级（19至25℃）。通过进一步改变工艺参数，过零的位置，例如零。在30℃时，温度可以变化，显示Zerodur〜（〜R）的诱人属性。用一小块Zerodur〜（〜R）进行的一系列CTE（0; 50℃）测量提供了厘米级的CTE均匀性信息：对于一个测量范围，在测量误差（5ppb / K）内未观察到CTE变化。折射率变化为+-2 * 10〜（-6）的模块新型的膨胀计正在开发中。预期在2002年夏季将获得首个操作结果，在17至30℃的温度范围内，其精度将提高至<2ppb / K。

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