Evaluation of contamination deposition on pinholes used in EUV at-wavelength PDI

机译：评估EUV波长PDI中使用的针孔上的污染物沉积

获取原文

获取原文并翻译 | 示例

页面导航

摘要
著录项
相似文献
相关主题

摘要

Point diffraction interferometry (PDI) is a promising candidate of the wavefront metrology for EUV lithographic projection optics. However, the pinhole used in the PDI is easily filled up with carbon contamination induced by EUV irradiation. We have evaluated the filling rate of pinholes by measuring decreasing rates of intensity of EUV radiation that passed through the pinholes. As a result, we found the filling rates of the pinholes depend on their materials and blowing of the oxygen. The filling rate was the slowest when the pinhole made of Ni was used and oxygen was blown.

机译：点衍射干涉仪（PDI）是EUV光刻投影光学器件波前计量学的有希望的候选者。但是，PDI中使用的针孔很容易被EUV辐射引起的碳污染填满。我们通过测量穿过针孔的EUV辐射强度降低的速率来评估针孔的填充率。结果，我们发现针孔的填充率取决于其材料和氧气的吹入。当使用由镍制成的针孔并吹入氧气时，填充速率最慢。

著录项

来源
《Conference on Emerging Lithographic Technologies VIII pt.2; 20040224-20040226; Santa Clara,CA; US》|2004年|P.702-709|共8页
会议地点 Santa Clara CA(US)
作者
Katsumi Sugisaki; Masanobu Hasegawa; Seima Kato; Chidane Ouchi; Jun Saito; Masahito Niibe; Akiyoshi Suzuki; Katsuhiko Murakami;
展开▼
作者单位

Sagamihara Laboratory, EUVA, 10-1, Asamizodai 1-chome, Sagamihara 228-0828, Japan;

展开▼
会议组织
原文格式 PDF
正文语种 eng
中图分类半导体技术;
关键词
EUV wavefront metrology; point diffraction interferometry; pinhole; contamination;

机译：EUV波前计量学；点衍射干涉法；针孔；污染;

相似文献

外文文献
中文文献
专利

1. Evaluation of pinhole defect in DLC film prepared by hybrid process of plasma-based ion implantation and deposition [J] . Yatsuzuka M, Tateiwa J, Uchida H Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2006,第11a12期

机译：基于等离子体离子注入和沉积混合工艺制备的DLC膜中的针孔缺陷的评估
2. Preparation of TiN Films by Ion Mixing and Vapor Deposition Technique and Their Pinhole Defect Evaluation [J] . Hitoshi UCHIDA, Masato YAMASHITA, Kazumasa TOKUDA 材料 . 2002,第1期

机译：通过离子混合和气相沉积技术制备锡膜及其针孔缺陷评价
3. Preparation of TiN Films by Ion Mixing and Vapor Deposition Technique and Their Pinhole Defect Evaluation [J] . Hitoshi UCHIDA, Masato YAMASHITA, Kazumasa TOKUDA 材料 . 2002,第1期

机译：离子混合和气相沉积技术制备TiN薄膜及其针孔缺陷评估
4. Evaluation of backside particle contamination and electrostatic chuck design on the cleanliness of EUV reticle mask blanks in a multilayer Mo/Si ion beam deposition system [C] . A.V. Hayes, R. Randive, I. Reiss, International symposium on photomask technology;Conference on photomask technology . 2008

机译：多层Mo / Si离子束沉积系统中EUV掩模版毛坯清洁度的背面颗粒污染和静电吸盘设计评估
5. Development of a Co-deposition method for Deposition of Low-Contamination Pyrite Thin Films. [D] . Walimbe, Aditya. 2016

机译：开发用于低污染黄铁矿薄膜沉积的共沉积方法。
6. Extraordinary Dynamic Near Vision in Champion Shotgun Shooters: PDI Check Evaluation of Stereo and Color without Floor Effect [O] . Steven Brown, Clayton Rue, Kyle Smith, 2021

机译：冠军霰弹枪射击者附近的非凡动态：PDI检查立体声和颜色的评估而无落地效果
7. Comparative14C and OSL dating of loess-paleosol sequences to evaluate post-depositional contamination ofn-alkane biomarkers [O] . Michael Zech, Sebastian Kreutzer, Roland Zech, 2017

机译：对比14℃和黄土古溶剂序列的OSL约会，评估碱酸碱污染的烷烃生物标志物

Evaluation of contamination deposition on pinholes used in EUV at-wavelength PDI

摘要

著录项

相似文献

相关主题

期刊订阅