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首页> 外文会议>Conference on Emerging Lithographic Technologies VIII pt.2; 20040224-20040226; Santa Clara,CA; US >Lithographic Characterization of EUVL Mask Blank Defects
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Lithographic Characterization of EUVL Mask Blank Defects

机译：EUVL掩模空白缺陷的光刻特征

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摘要

The strong smoothing effect resulting from recent progress in multilayer deposition technology has a great influence on the imaging characteristics of mask blank defects. The imaging characteristics of such defects were investigated through accurate simulations employing the FDTD method; and the effect of multilayer smoothing on the aerial image was examined. Strong smoothing was found to suppress the degradation in the aerial image due to phase defects while at the same time giving rise to phase defects that are undetectable with a visible-light inspection tool. 3-dimensional simulations also indicated the existence of such defects. Moreover, the aerial image of phase defects after repair with an electron beam was also investigated. Repair was found to be effective when there was no smoothing, but not so effective when there was strong smoothing. Experimental verification of these results will be attempted in the near future.
机译：多层沉积技术的最新进展所产生的强平滑效果对掩模空白缺陷的成像特性有很大影响。通过使用FDTD方法的精确模拟研究了此类缺陷的成像特性。并检查了多层平滑对航空图像的影响。发现强平滑可以抑制由于相位缺陷引起的航拍图像的退化，同时会产生可见光检查工具无法检测到的相位缺陷。 3维模拟也表明存在此类缺陷。此外，还研究了用电子束修复后的相缺陷的航空图像。发现在没有平滑的情况下修复是有效的，但是在具有较强的平滑的情况下修复不那么有效。这些结果的实验​​验证将在不久的将来进行。

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