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首页> 外文会议>Conference on Emerging Lithographic Technologies VIII pt.2; 20040224-20040226; Santa Clara,CA; US >High repetition rate MPC generator-driven capillary Z-pinch EUV source
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High repetition rate MPC generator-driven capillary Z-pinch EUV source

机译：高重复率MPC发生器驱动的毛细管Z夹EUV离子源

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摘要

Discharge-produced plasma (DPP) based EUV source have been studied and developed at EUVA/Gotenba Branch. Among the several kinds of discharge scheme, a capillary Z-pinch has been employed in our source. An all-solid-state magnetic pulse compression (MPC) generator was used to create a Z-pinch plasma. Low inductance MPC generator provides a pulsed current with about 17 kA of peak amplitude and 350 ns of pulse duration, and allows 2-kHz continuous operation. A water-cooled discharge head was coupled with the MPC generator. In order to evaluate the source performance, electrical energy input to the discharge, EUV radiation power, radiation spatial profile, pinhole image and spectra were observed. 54.4 W/2πsr/2%BW of 13.5-nm EUV output was achieved at 2-kHz operation. Through the radiation profile measurement and pinhole-camera observation, spatial image of EUV radiation was understood.
机译：EUVA /御殿场分公司已经研究和开发了基于放电产生等离子体（DPP）的EUV源。在几种放电方案中，我们的离子源已采用毛细管Z形夹。全固态磁脉冲压缩（MPC）生成器用于创建Z捏等离子体。低电感MPC发生器提供的脉冲电流的峰值幅度约为17 kA，脉冲持续时间为350 ns，并允许2 kHz连续工作。水冷的排放头与MPC发电机相连。为了评估源性能，观察到放电的电能输入，EUV辐射功率，辐射空间分布，针孔图像和光谱。在2 kHz的工作频率下获得了13.5 nm EUV输出的54.4 W /2πsr/ 2％BW。通过辐射剖面测量和针孔相机观察，可以了解EUV辐射的空间图像。

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