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首页> 外文会议>Conference on Emerging Lithographic Technologies VIII pt.2; 20040224-20040226; Santa Clara,CA; US >Status of EUV-Lamp Development and Demonstration of Applications
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Status of EUV-Lamp Development and Demonstration of Applications

机译：EUV灯的开发现状和应用示范

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摘要

Compact, flexible laboratory sources offer advanced flexibility in developing components for EUV-lithography by supplementing beamlines at storage rings. Hence, they are the basis for transferring EUV-metrology and technology to individual, industrial and university R&D labs. Laboratory sources have features similar to the sources planned for EUVL production on one hand and offer high flexibility like storage ring beamlines on the other hand. Discharge based EUV sources offer some flexibility, which allow for tuning of the spectral and spatial characteristics of their emission. Depending on the system complexity sources can be supplied in various forms ranging from low budget semi-manual systems over OEM components to fully automatic stand-alone sources. As power scaling has been demonstrated by just adding higher power generators and cooling, these sources can be matched to various levels of flux requirements. AIXUV's discharge based EUV-sources have been used as beamline supplement for tasks closely connected with the development of EUV-Lithography. Examples are: development of tools for EUV source characterization (prototype testing, qualification and calibration), "in-band-EUV" open frame resist exposure, reflectometry of EUV mask blanks and EUV mirrors and for basic research using XUV radiation as thin film analytics and EUV microscopy.
机译：紧凑，灵活的实验室光源通过补充存储环上的光束线，为开发EUV光刻组件提供了更高的灵活性。因此，它们是将EUV计量学和技术转移到个人，工业和大学研发实验室的基础。实验室放射源一方面具有与计划用于EUVL生产的放射源相似的功能，另一方面还具有高灵活性，例如存储环束线。基于放电的EUV源具有一定的灵活性，可以调整其发射的光谱和空间特性。根据系统复杂性，可以以各种形式提供源，从通过OEM组件的低预算半手动系统到全自动独立源。由于仅通过增加更高的发电机和冷却装置就可以实现功率缩放，因此这些电源可以满足各种通量要求。 AIXUV基于放电的EUV源已被用作与EUV光刻技术发展紧密相关的任务的光束线补充。示例包括：开发用于EUV源表征（原型测试，鉴定和校准），“带内EUV”开放式框架抗蚀剂曝光，EUV掩模坯料和EUV镜的反射仪以及使用XUV辐射作为薄膜分析的基础研究的工具。和EUV显微镜。

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