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首页> 外文会议>Conference on Emerging Lithographic Technologies VIII pt.2; 20040224-20040226; Santa Clara,CA; US >Status of EUV microexposure capabilities at the ALS using the 0.3-NA MET optic
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Status of EUV microexposure capabilities at the ALS using the 0.3-NA MET optic

机译：使用0.3 NA MET光学元件的ALS的EUV微曝光能力的状态

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摘要

The success of recent static printing experiments at Lawrence Berkeley National Laboratory's Advanced Light Source (ALS) using the EUV LLC Engineering Test Stand (ETS) Set-2 optic has demonstrated the utility of synchrotron-based EUV exposure stations. Although not viable light sources for commercial lithography, synchrotrons provide clean, convenient, and extremely flexible sources for developmental microfield lithography. The great flexibility of synchrotron-based illumination arises from the fact that such sources facilitate active coherence reduction, thus enabling the coherence function, or pupil fill, to be actively sculpted in real time. As the commercialization of EUV progresses, the focus of developmental EUV lithography is shifting from low numerical aperture (NA) tools such as the 0.1-NA ETS to higher-NA tools such as the 0.3-NA Micro Exposure Tool (MET). To support printing with MET optics at the ALS, a new printing station has been developed, relying on a scanning illuminator to provide programmable coherence (pupil-fill) control. The illuminator is designed to operate up to a coherence factor (a) of 1 and support the full 200x600 design printed field of view. In addition to a new illuminator design, new focus sensing and dose-control systems have also been implemented. Here we describe the MET printing capabilities in detail and present preliminary printing results with the Sematech Set-2 MET optic.
机译：劳伦斯伯克利国家实验室的高级光源（ALS）最近使用EUV LLC工程测试台（ETS）Set-2光学元件进行的静态印刷实验成功，证明了基于同步加速器的EUV曝光站的实用性。同步加速器虽然不是用于商业光刻的可行光源，但可为开发的微场光刻提供清洁，方便且极其灵活的光源。基于同步加速器的照明的极大灵活性来自于这样的事实，即此类光源有助于主动降低相干性，从而能够实时主动地雕刻相干函数或瞳孔填充。随着EUV商业化的发展，EUV光刻技术的发展重点已从低数值孔径（NA）工具（例如0.1NA NA ETS）转移到了更高NA工具（例如0.3NA NA Micro Exposure Tool（MET））。为了支持在ALS上使用MET光学元件进行打印，已经开发了一个新的打印站，它依靠扫描照明器提供可编程的相干（瞳孔填充）控制。照明器设计为可在高达1的相干系数（a）下运行，并支持200x600设计的完整印刷视场。除了新的照明器设计之外，还已经实现了新的焦点感应和剂量控制系统。在这里，我们将详细介绍MET打印功能，并介绍Sematech Set-2 MET光学系统的初步打印结果。

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