High-resolution EUV Microstepper tool for resist testing technology evaluation

机译：高分辨率EUV微步进工具，用于抗蚀剂测试和技术评估

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摘要

Key features are presented of the Exitech MS-13 EUV Microstepper tool developed for EUV resist testing & technology evaluation at the 32nm node and beyond. Details of the tool design architecture, module layout, vacuum chamber, major subsystems including source, optics and performance specifications are given.

机译：介绍了Exitech MS-13 EUV微步进器工具的主要功能，该工具是为在32nm节点及以后进行EUV抗蚀剂测试和技术评估而开发的。给出了工具设计架构，模块布局，真空室，主要子系统（包括光源，光学器件和性能规格）的详细信息。

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来源
《Conference on Emerging Lithographic Technologies VIII pt.2; 20040224-20040226; Santa Clara,CA; US》|2004年|P.869-880|共12页
会议地点 Santa Clara CA(US)
作者
A Brunton; J Cashmore; P Elbourn; G Elliner; M Gower; P Gruenewald; M Harman; S Hough; N McEntee; S Mundair; D Rees; P Richards; V Truffert; I Wallhead; M Whitfield;
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作者单位

Exitech Ltd, Oxford Industrial Park, Yarnton, Oxford OX5 1QU, England;

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会议组织
原文格式 PDF
正文语种 eng
中图分类半导体技术;
关键词
EUV lithography; microsteppers;

机译：EUV光刻；微步进;

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专利

1. Fabrication of high-aspect-ratio transmission grating using DDR process for 10 nm EUV resist evaluation by EUV interference lithography [J] . Yoshifuji Mana, Niihara Shota, Harada Tetsuo, Japanese journal of applied physics . 2019,第SD期

机译：使用DDR工艺制造高纵横比透射光栅，以通过EUV干涉光刻技术评估10 nm EUV抗蚀剂
2. Fabrication of high-aspect-ratio transmission grating using DDR process for 10 nm EUV resist evaluation by EUV interference lithography [J] . Yoshifuji Mana, Niihara Shota, Harada Tetsuo, Japanese journal of applied physics . 2019,第SD期

机译：使用DDR工艺制造高纵横比传动光栅10nm EUV抗蚀剂评估通过EUV干扰光刻
3. Fabrication of High-Aspect-Ratio Transmission Grating Using DDR Process for 10-nm EUV Resist Evaluation by EUV Interference Lithography [J] . Yoshifuji Mana, Niihara Shota, Harada Tetsuo, Journal of Photopolymer Science and Technology . 2018,第2期

机译：使用DDR工艺制造高纵横比传动光栅通过EUV干扰光刻使用DDR工艺进行10-NM EUV抵抗评估
4. High-resolution EUV Microstepper tool for resist testing technology evaluation [C] . A Brunton, J Cashmore, P Elbourn, High-Power Laser Ablation V pt.2 . 2004

机译：高分辨率EUV微步进工具，用于抗蚀剂测试和技术评估
5. High-Resolution, Quantitative, and Three-Dimensional Coherent Diffractive Imaging with a Tabletop EUV Source [D] . Shanblatt, Elisabeth Rose. 2017

机译：具有桌面EUV源的高分辨率，定量和三维相干衍射成像
6. High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results [O] . Theodore Manouras, Panagiotis Argitis 2020

机译：高敏感性抗蚀性对EUV光刻进行抗衡性：材料设计策略和绩效结果综述
7. The user testing toolset: a decision support system to aid the evaluation of assistive technology products [O] . Andree Woodcock, Simon Fielden, Richard Bartlett 2012

机译：用户测试工具集：决策支持系统，以帮助评估辅助技术产品

High-resolution EUV Microstepper tool for resist testing technology evaluation

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