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首页> 外文会议>Conference on laser applications in microelectronic and optoelectronic manufacturing VII; 20090126-29; San Jose, CA(US) >Ablation of aluminum nitride films by nanosecond and femtosecond laser pulses
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Ablation of aluminum nitride films by nanosecond and femtosecond laser pulses

机译：纳秒和飞秒激光脉冲烧蚀氮化铝膜

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摘要

We present results of comparative study of laser-induced ablation of AlN films with variable content of oxygen as a surface-doping element. The films deposited on sapphire substrate were ablated by a single nanosecond pulse at wavelength 248 nm, and by a single femtosecond pulse at wavelength 775 nm in air at normal pressure. Ablation craters were inspected by AFM and Nomarski high-resolution microscope. Irradiation by nanosecond pulses leads to a significant removal of material accompanied by extensive thermal effects, chemical modification of the films around the ablation craters and formation of specific defect structures next to the craters. Remarkable feature of the nanosecond experiments was total absence of thermo-mechanical fracturing near the edges of ablation craters. The femtosecond pulses produced very gentle ablation removing sub-micrometer layers of the films. No remarkable signs of thermal, thermo-mechanical or chemical effects were found on the films after the femtosecond ablation. We discuss mechanisms responsible for the specific ablation effects and morphology of the ablation craters.
机译：我们提出比较研究结果的激光诱导烧蚀的AlN膜具有可变的氧含量作为表面掺杂元素。在常压下，通过在波长248 nm处的单个纳秒脉冲和在波长775 nm处的单个飞秒脉冲，烧蚀沉积在蓝宝石衬底上的薄膜。用AFM和Nomarski高分辨率显微镜检查烧蚀坑。纳秒脉冲辐照会导致材料的大量去除，并伴有广泛的热效应，烧蚀坑周围膜的化学改性以及在坑附近形成特定的缺陷结构。纳秒实验的显着特征是在烧蚀坑的边缘附近完全没有热机械断裂。飞秒脉冲产生非常温和的烧蚀，去除了薄膜的亚微米层。飞秒消融后在薄膜上未发现明显的热，热机械或化学作用迹象。我们讨论了负责特定烧蚀效果和烧蚀弹坑形态的机制。

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