Pulsed VUV Sources and their Application to Surface Cleaning of Optical Materials

机译：脉冲VUV源及其在光学材料表面清洁中的应用

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Development of pulsed excitation techniques for high-pressure dielectric barrier discharges (DBD) has led to a short-pulsed, high-peak-power, spatially uniform source of UV7VUV radiation - a preferred type of output for materials processing and many other applications. Results of such a Xe_2~* DBD source at 172 nm for removing mountants from optical surfaces and for removing hydrocarbon contamination from optical and polymer surfaces are presented.

机译：用于高压介电势垒放电（DBD）的脉冲激励技术的发展导致了UV7VUV辐射的短脉冲，高峰值功率，空间均匀的光源-这是材料加工和许多其他应用的首选输出类型。给出了这种Xe_2〜* DBD源在172 nm处用于从光学表面去除固定剂以及从光学和聚合物表面去除碳氢化合物污染的结果。

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《Conference on Laser-Assisted Micro- and Nanotechnologies 2003; Jun 29-Jul 3, 2003; St. Petersburg, Russia》|2003年|p.100-106|共7页
会议地点 St. Petersburg(RU);St. Petersburg(RU);St. Petersburg(RU);St. Petersburg(RU);St. Petersburg(RU);St. Petersburg(RU);St. Petersburg(RU);St. Petersburg(RU)
作者
D.M. Kane; D. Hirschausen; B.K.Ward; R.J. Carman; R.P. Mildren;
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作者单位

Department of Physics, Macquarie University ～ Sydney, NSW 2109, Australia;

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会议组织
原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
关键词
DBD; short pulse VUV source; surface cleaning; surface treatment; optical surface cleaning; glass cleaning; polymers;

机译：DBD;短脉冲VUV源;表面清洁;表面处理;光学表面清洁;玻璃清洁;聚合物;

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专利

1. Synchrotron-based VUV spectroscopic ellipsometry system in application to optical properties studies of wide-bandgap materials for optoelectronics [J] . Krzysztof DORYWALSKI, Aleksy PATRYN, Bohdan ANDRIYEVSKY, Przeglad Elektrotechniczny . 2014,第3期

机译：基于同步加速器的VUV椭圆偏振光谱分析系统在光电子宽带隙材料光学性能研究中的应用
2. SMALL PULSED ELECTRON-ION SOURCES FOR RADIATION TECHNOLOGIES AND SURFACE MODIFICATION OF MATERIALS [J] . Korenev SA., Perry AJ. Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 1996,第9期

机译：辐射技术和材料表面改性的小脉冲电子源
3. Surface modification during Nd : YAG (1064 nm) pulsed laser cleaning of organic fibrous materials [J] . Strlic M., Kolar J., Selih VS., Applied Surface Science . 2003,第1a4期

机译：Nd：YAG（1064 nm）脉冲激光清洁有机纤维材料过程中的表面改性
4. Pulsed VUV Sources and their Application to Surface Cleaning of Optical Materials [C] . D.M. Kane, D. Hirschausen, B.K.Ward, International conference on laser-assisted micro- and nanotechnologies . 2003

机译：脉冲VUV源及其应用于光学材料的表面清洁
5. VUV/UV radiation interaction with silicon dioxide: Towards the next generation of 157 nm optical lithography materials. [D] . Haines, Christopher Dale. 2003

机译：VUV / UV辐射与二氧化硅的相互作用：走向下一代157 nm光学光刻材料。
6. Comparison of materials used for cleaning equipment in retail food premises and of two methods for the enumeration of bacteria on cleaned equipment and work surfaces [O] . R. J. Gilbert 1970

机译：比较零售食品场所清洁设备所用的材料以及在清洁的设备和工作表面上进行细菌计数的两种方法
7. Real time optical diagnostics during pulsed uv laser induced surface cleaning and oxidation [O] . Afonso Carmen N., Vega F., Solís Céspedes Javier 2013

机译：脉冲紫外激光诱导的表面清洁和氧化过程中的实时光学诊断
8. Chemical Cleaning of Aluminum Alloy Surfaces for Use as Vacuum Materials in Synchrotron Light Sources [R] . Kaufherr, N., Krauss, A., Gruen, D. M., 1989

机译：用于同步加速器光源中真空材料的铝合金表面的化学清洗

Pulsed VUV Sources and their Application to Surface Cleaning of Optical Materials

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