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首页> 外文会议>Conference on Micro- and Nanoelectronics; 20031006-20031010; Zvenigorod; RU >Magnetic force microscopy of magnetization reversal of microstructures in situ in the external field of up to 2000Oe
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Magnetic force microscopy of magnetization reversal of microstructures in situ in the external field of up to 2000Oe

机译：在高达2000Oe的外场中原位显微组织的磁化反转的磁力显微镜

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摘要

This work is devoted to the investigation of the magnetization reversal of microstructures directly in the magnetic force microscope (MFM) when the external field on the sample is created with an electromagnet installed into the microscope. By using special samples containing Co ferromagnetic micropatterns it was shown that the magnetization reversal of the tip of the microscope in the high magnetic field led to the essential transformation of the MFM images of planar magnetic microstructures. The computer simulation of the corresponding MFM images confirmed this conclusion. The analysis of the experimental MFM images of Co micropatterns obtained at the magnetic field in the range from -2000 up to 2000 Oe allowed us to estimate the coercivity of magnetic tips. The knowledge about the tip magnetic properties and computer simulation gave a possibility to interpret the MFM images of the samples in the strong magnetic field more correctly.
机译：这项工作致力于直接在磁力显微镜（MFM）中研究微观结构的磁化反转，当样品上的外场是由安装在显微镜中的电磁体产生时。通过使用包含钴铁磁微图案的特殊样品，表明在高磁场中显微镜尖端的磁化反转导致平面磁微结构的MFM图像发生本质转变。相应的MFM图像的计算机仿真证实了这一结论。对在-2000至2000 Oe范围内的磁场中获得的Co微图案的实验MFM图像的分析，使我们能够估算出磁头的矫顽力。有关尖端磁性能和计算机仿真的知识为更正确地解释样品在强磁场中的MFM图像提供了可能。

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