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首页> 外文会议>Conference on Optical Design and Engineering; Sep 30-Oct 3, 2003; St.Etienne, France >The effect of intrinsic birefringence in deep UV-lithography
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The effect of intrinsic birefringence in deep UV-lithography

机译：固有双折射在深紫外光刻中的作用

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摘要

The subject of birefringence induced by spatial dispersion (BISD), also called intrinsic birefringence, recently became an important issue for 157-nm lithography. For the deep UV range, because of intrinsic absorption, only crystalline materials can be used as optical materials for lens manufacturing. The physical properties of crystals are basically affected by spatial dispersion, especially at very short wavelengths. The resulting BISD leads to a serious deterioration of optical image quality. Recently the mathematical formalism for analyzing those aspects of the BISD effect that are relevant for optical design has been published. In this work we give an equivalent but simplified derivation of these results. This mathematical formalism is then applied to optical system design and the correction methodology is discussed. An example of optical system is given that has been corrected for the BISD effect.
机译：由空间色散（BISD）引起的双折射（也称为固有双折射）主题最近成为157 nm光刻的重要问题。对于深紫外线范围，由于固有吸收，只能将结晶材料用作镜片制造的光学材料。晶体的物理性质基本上受空间色散的影响，尤其是在非常短的波长下。最终的BISD导致光学图像质量严重下降。最近，已经发布了用于分析BISD效应与光学设计相关的那些方面的数学形式主义。在这项工作中，我们给出了这些结果的等效但简化的推导。然后将这种数学形式主义应用于光学系统设计，并讨论校正方法。给出了已针对BISD效应进行校正的光学系统示例。

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