首页> 外文会议>Conference on Photon Processing in Microelectronics and Photonics Jan 21-24, 2002 San Jose, USA >TEM investigations of thermal effects on material structure induced by femtosecond and nanosecond laser processing
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TEM investigations of thermal effects on material structure induced by femtosecond and nanosecond laser processing

机译:飞秒和纳秒激光加工对材料结构的热效应的TEM研究

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Holes drilled in Aluminum using nanosecond and femtosecond laser pulses are characterized by Transmission Electronic Microscopy (TEM). Hence we present a method for quantifying the dimensions of the heat affected zone (HAZ) surrounding micro-holes by analyzing the grain size evolution. Drilled samples investigations are performed after electrolytic thinning down to 100 nm. The experiments require a real time imaging system to shot close to the located thinner zone with an accuracy in the μm range. Thin Al samples are drilled both in nanosecond and femtosecond regimes using the same pulse number and the same Ti-Sapphire laser source (1 kHz, 800 nm). The regeneratively amplified ultra-short pulses (150 fs) are utilized at a low fluence regime (typically 0.01-0.5 mJ/pulse), while the longer pulses (ns) are obtained from the regenerative amplifier without oscillator seeding (0.5 mJ,τ~ 7-8 ns). The main conclusion is that a 40 μm wide HAZ is induced by nanosecond pulses, whereas the femtosecond regime does not produce any TEM observable HAZ. It has to be noticed that the width of the femtosecond HAZ is roughly less than 2 μm, which is our observation limit.
机译:使用透射电子显微镜(TEM)对使用纳秒和飞秒激光脉冲在铝上钻孔的孔进行表征。因此,我们提出了一种通过分析晶粒尺寸演变来量化微孔周围热影响区(HAZ)尺寸的方法。在电解减薄至100 nm之后进行钻孔样品研究。实验需要一个实时成像系统,以接近微米范围的精度拍摄靠近所定位的较薄区域。使用相同的脉冲数和相同的钛-蓝宝石激光源(1 kHz,800 nm)在纳秒和飞秒范围内钻削薄铝样品。再生放大的超短脉冲(150 fs)在低通量状态下使用(通常为0.01-0.5 mJ /脉冲),而较长的脉冲(ns)是从再生放大器获得的,而没有晶种(0.5 mJ,τ〜) 7-8 ns)。主要结论是纳秒级脉冲会诱发40μm宽的热影响区,而飞秒模式则不会产生任何TEM可观察到的热影响区。必须注意,飞秒热影响区的宽度大约小于2μm,这是我们的观察极限。

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