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首页> 外文会议>Conference on Photon Processing in Microelectronics and Photonics Jan 21-24, 2002 San Jose, USA >UV laser radiation-induced modifications and microstructuring of glass
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UV laser radiation-induced modifications and microstructuring of glass

机译：UV激光辐射诱导的玻璃改性和微结构化

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摘要

Modifications and microstructures are generated on the surface and in the volume of silicate glasses using pulsed UV laser radiation of small pulse length. During the interaction of pulsed excimer laser radiation (193 nm/20 ns, 248 nm/20 ns, 308 nm/40 ns, 351 nm/20 ns) and frequency-trippled Nd:YAG laser radiation (355 nm/10 ns) with intensities below the removal-threshold of the cerium- and silver-doped multi-component silicate glass absorption centers in the UV are induced. Subsequent thermal treatment and wet chemical etching results in crystallisation of the laser-illuminated absorbing region and in the fabrication of microstructures on the surface. Processing of sodalime- and boro-silicate glass with pulsed ArF excimer laser radiation (193 nm/20 ns) and frequency-doubled Nd:YAG laser radiation (532 nm, 1064 nm/40 ps) with intensities above the removal-threshold leads to microstructures including the generation of microcracks on the surface and in the bulk. The dynamics and the transmission of the expanding plasma and changes in the refractive index of the glass are investigated with Speckle photography using the pump and probe method. The determination of plasma emission and crack generation is carried out using high speed- and Nomarski photography. Morphological and chemical properties of the debris generated under defined processing gas atmospheres are investigated with REM, white light interferometry, XPS and EPMA. Induced absorption and changes of the crystalline-phase are probed using optical-spectroscopy and XRD as well REM. On the basis of these investigations the processes of the generation of induced absorption centers and crystallisation on the one hand and the generation of cracks and debris on the other hand as well as the quality of the produced microstructures is discussed.
机译：使用小脉冲长度的脉冲UV激光辐射会在硅酸盐玻璃的表面和体积中产生修饰和微观结构。在脉冲准分子激光辐射（193 nm / 20 ns，248 nm / 20 ns，308 nm / 40 ns，351 nm / 20 ns）和三重Nd：YAG激光辐射（355 nm / 10 ns）相互作用期间在紫外光下，诱导了低于铈和银掺杂的多组分硅酸盐玻璃吸收中心的去除阈值的强度。随后的热处理和湿法化学蚀刻导致激光照射的吸收区域结晶，并在表面上形成微结构。用脉冲ArF准分子激光辐射（193 nm / 20 ns）和倍频Nd：YAG激光辐射（532 nm，1064 nm / 40 ps）强度高于去除阈值的钠钙玻璃和硼硅酸盐玻璃的加工导致微观结构，包括在表面和整体上产生微裂纹。使用泵和探针法通过散斑摄影研究了膨胀等离子体的动力学和透射以及玻璃折射率的变化。使用高速摄影和Nomarski摄影进行等离子体发射和裂纹产生的确定。利用REM，白光干涉仪，XPS和EPMA研究了在确定的处理气体气氛下产生的碎片的形态和化学性质。使用光谱学和XRD以及REM来探测诱导的吸收和结晶相的变化。在这些研究的基础上，讨论了一方面产生诱导吸收中心和结晶，另一方面产生裂纹和碎屑的过程以及所产生的微结构的质量。

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