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ZnO Homoepitaxy

机译:ZnO同质外延

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摘要

This paper investigates the properties of homoepitaxial growth of ZnO. High quality bulk ZnO crystals have been produced by melt growth techniques in addition to ZnO thin films grown by Metalorganic Chemical Vapor Deposition (MOCVD) on bulk ZnO substrates(Zinc side and Oxygen side). The photoluminescence showed the dominance of strong and narrow band due to the band edge emissions for undoped ZnO. UV transmission showed sharp transition indication good crystal quality. High resolution x-ray diffraction measurements (HRXRD) along with rocking curve showed excellent crystal quality with full width at half maximum values close to 100 arc seconds.
机译:本文研究了ZnO的同质外延生长特性。除了通过金属有机化学气相沉积(MOCVD)在块状ZnO衬底(锌侧和氧侧)上生长的ZnO薄膜外,还通过熔体生长技术生产了高质量的块状ZnO晶体。由于未掺杂的ZnO的能带边缘发射,光致发光显示出强能带和窄能带占主导地位。紫外线透射率显示出急剧的转变,表明晶体质量良好。高分辨率x射线衍射测量(HRXRD)以及摇摆曲线显示出卓越的晶体质量,其全宽度为接近100弧秒的一半最大值。

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