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首页> 外文会议>Conference on X-Ray Mirrors, Crystals, and Multilayers Jul 30-31, 2001, San Diego, USA >Stitching Interferometry for the Wavefront Metrology of X-ray Mirrors
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Stitching Interferometry for the Wavefront Metrology of X-ray Mirrors

机译：X射线镜波前计量的拼接干涉术

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摘要

We discuss the possibility of using Stitching Interferometry for the surface shape metrology of X-ray Mirrors. Indeed, Stitching Interferometry combines a large field of measurement with a high lateral resolution. In other words, it provides large-scale and medium-scale measurements in a single instrument. Small-scale deformations is considered here to be "roughness", and will not be dealt with in this article. The only potential problem in Stitching Interferometry is large-scale fluctuation. This is not due to the Stitching Process itself, but to small measurement errors which get "amplified" by the long dimension of the typical X-ray Mirror. This will be addressed, and it will be shown that it need not be a problem. As we have not completed our series of experimental measurements, we will illustrate our article with stitching measurements performed on large MegaJoule components (800 x 400 mm), and show an example of "Mixed Stitching", involving measurement files of different origin.
机译：我们讨论了将缝合干涉术用于X射线镜的表面形状计量的可能性。确实，缝合干涉术结合了大的测量范围和高的横向分辨率。换句话说，它可以在一台仪器中提供大规模和中等规模的测量。小规模的变形在这里被认为是“粗糙度”，在本文中将不再讨论。拼接干涉术中唯一潜在的问题是大范围的波动。这不是由于缝合过程本身，而是由于较小的测量误差，这些误差会因典型X射线镜的长尺寸而“放大”。这将得到解决，并且将证明它不一定是问题。由于我们还没有完成一系列的实验测量，因此我们将通过在大型MegaJoule组件（800 x 400 mm）上执行的缝合测量来说明我们的文章，并显示“混合缝合”的示例，其中涉及不同来源的测量文件。

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