The Tapping Process in Silicon Production

机译：硅生产中的攻丝过程

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The paper presents the most important problems and challenges in the tapping process in the silicon production. The possible impact of improper draining of the silicon furnace is described, as well as some root causes of the formation of the tapping gas. Some ongoing improvements in the tapping process are described. The aim of these are to improve the performance of the silicon production process as well as to improve the internal environmental standards in the plant studied.

机译：本文提出了硅生产中攻丝过程中最重要的问题和挑战。描述了硅熔炉排空不当可能产生的影响，以及一些自来气体形成的根本原因。描述了攻丝过程中一些正在进行的改进。这些目的是为了提高硅生产工艺的性能以及改善所研究工厂的内部环境标准。

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来源
《Conference on Silicon for the Chemical Industry VI; 20020617-20020621; Loen; NO》|2002年|P.39-46|共8页
会议地点 Loen(NO)
作者
Halvard Tveit; Torbjorn Halland; Kjell-Ingar Landro; Stein Tore Johansen; Benjamin Ravary;
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作者单位

Elkem Thamshavn, P.O.Box 10, N-7301 Orkanger;

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原文格式 PDF
正文语种 eng
中图分类硅Si;
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4. The Tapping Process in Silicon Production [C] . Halvard Tveit, Torbjorn Halland, Kjell-Ingar Landro, Conference on silicon for the chemical industry . 2002

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The Tapping Process in Silicon Production

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