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Characterization of Amorphous Anodic Nb_2O_5 Nanofilm for Gas Sensing

机译：非晶态阳极Nb_2O_5纳米膜的气敏特性

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摘要

Amorphous Nb_2O_5 film of 167 nm thickness was fabricated by anodic oxidation of sputter deposited niobium and characterized by TEM, GD-OES and AFM. The electric properties of the anodic films with sputter-deposited circular gold electrodes were studied by AC impedance spectroscopy in ambient gas atmospheres of air, argon, oxygen or hydrogen in the temperature range of 25 - 200℃. The amorphous Mb_2O_5 showed the character of n-type semiconductor. The conductivity of the film, following the Arrhenius behaviour, was independent of the oxygen partial pressure, but was largely dependent on hydrogen partial pressure. The conductivity of the Nb_2O_5 film at room temperature in dry hydrogen was 2.2 orders of magnitude as high as that in air. The enhanced conductivity could be associated with partial reduction of Nb~(5+) in dry hydrogen atmosphere. The addition of water vapor to hydrogen atmosphere reduced conductivity probably due to suppressing the reduction of Nb_2O_5.
机译：通过阳极氧化溅射沉积铌制备了厚度为167 nm的非晶Nb_2O_5薄膜，并通过TEM，GD-OES和AFM对其进行了表征。通过交流阻抗谱研究了在25-200℃温度范围内的空气，氩气，氧气或氢气等环境气体气氛中具有溅射沉积的圆形金电极的阳极膜的电性能。非晶态Mb_2O_5表现出n型半导体的特性。遵循Arrhenius行为的薄膜电导率与氧分压无关，但在很大程度上取决于氢分压。 Nb_2O_5薄膜在室温下在干燥氢气中的电导率是在空气中的2.2个数量级。电导率的提高可能与干燥氢气氛中Nb〜（5+）的部分还原有关。将水蒸气添加到氢气氛中可能降低了电导率，这可能是由于抑制了Nb_2O_5的还原。

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  • 来源
    《Corrosion posters (General)》|2008年|57-65|共9页
  • 会议地点 Honolulu HI(US);Honolulu HI(US)
  • 作者

    Damian Kowalski; Yoshitaka Aoki; Hiroki Habazaki;

  • 作者单位

    Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, JAPAN;

    Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, JAPAN;

    Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, JAPAN;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 材料腐蚀与保护;
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