首页> 外文会议>Damage to VUV, EUV, and X-ray optics VI >Study of Performance Loss of Lyman Alpha Filters due to Chemical Contamination
【24h】

Study of Performance Loss of Lyman Alpha Filters due to Chemical Contamination

机译:化学污染引起的Lyman Alpha过滤器性能损失的研究

获取原文
获取原文并翻译 | 示例

摘要

Observations in the UV and EUV allow many diagnostics of the outer layers of the stars and the Sun so that more and more space telescopes are developed to operate in this fundamental spectral range. However, absorption by residual contaminants coming from polymers outgassing causes critical effects such as loss of signal, spectral shifts, stray light... Thus, a cleanliness and contamination control plan has to be defined to mitigate the risk of damage of sensitive surfaces. In order to specify acceptable cleanliness levels, it is paramount to improve our knowledge and understanding of contamination effects, especially in the UV/EUV range. Therefore, an experimental study has been carried out in collaboration between CNES and IAS, in the frame of the development of the Extreme UV Imager suite for the ESA Solar Orbiter mission; this instrument consists of two High Resolution Imagers and one Full Sun Imager designed for narrow pass-band EUV imaging of the solar corona, and thus very sensitive to contamination. Here, we describe recent results of performance loss measured on representative optical samples. Six narrow pass-band filters, with a multilayer coating designed to select the solar Lyman Alpha emission ray, were contaminated with different amounts of typical chemical species. The transmittance spectra were measured between 100 and 200 nm under high vacuum on the SOLEIL synchrotron beam line. They were compared before and after contamination, and also after a long exposure of the contaminated area to EUV-visible radiations.
机译:紫外线和EUV的观测可以对恒星和太阳的外层进行许多诊断,因此,越来越多的太空望远镜被开发在此基本光谱范围内工作。然而,来自聚合物脱气的残留污染物的吸收会导致严重的影响,例如信号损失,光谱偏移,杂散光等。因此,必须制定清洁度和污染控制计划,以减轻损坏敏感表面的风险。为了指定可接受的清洁度水平,最重要的是提高我们对污染影响的了解和理解,尤其是在UV / EUV范围内。因此,在开发用于ESA太阳轨道飞行器任务的Extreme UV Imager套件的框架内,CNES和IAS合作进行了一项实验研究。该仪器包括两台高分辨率成像仪和一台全日光成像仪,专为对日冕进行窄通带EUV成像而设计,因此对污染非常敏感。在这里,我们描述了在代表性光学样品上测得的性能损失的最新结果。六个带有多层涂层的窄通带滤光片设计用于选择太阳Lyman Alpha发射射线,被不同数量的典型化学物质污染。在SOLEIL同步加速器光束线上在高真空下在100至200 nm之间测量透射光谱。在污染前后,污染区长时间暴露在EUV可见辐射下进行比较。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号