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Measurement and Optimization of Electrical Process Window

机译：电气过程窗口的测量和优化

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摘要

Process window (PW) is a collection of values of process parameters that allow circuit to be printed and to operate under desired specifications. Conventional process window which is determined through geometrical fidelity, geometric process window (GPW), does not account for lithography effects on electrical metrics such as delay and power. In contrast to GPW, this paper introduces electrical process window (EPW) which accounts for electrical specifications. Process parameters are considered within EPW if the performance (delay and leakage power) of printed circuit is within desired specifications. Our experiment results show that the area of EPW is 1.5～6× larger than that of GPW. This implies that even if a layout falls outside geometric tolerance, the electrical performance of the circuit may satisfy desired specifications. In addition to process window evaluation, we show that EPW can be enlarged by 10% on average using gate length biasing and V_(th) push. We also propose approximate methods to evaluate EPW, which can be used in the absence of any design information. Our results show that the proposed approximation method can estimate more than 80% of the area of reference EPW.
机译：过程窗口（PW）是过程参数值的集合，这些参数允许印刷电路并在所需规格下运行。通过几何保真度确定的常规工艺窗口，几何工艺窗口（GPW）并未考虑光刻对电气指标（例如延迟和功率）的影响。与GPW相比，本文介绍了解释电气规格的电气过程窗口（EPW）。如果印刷电路的性能（延迟和泄漏功率）在所需规格之内，则在EPW中考虑工艺参数。实验结果表明，EPW的面积比GPW大1.5〜6倍。这意味着，即使布局落在几何公差之外，电路的电气性能也可以满足期望的规格。除了评估过程窗口外，我们还表明，使用栅极长度偏置和V_（th）推动，EPW平均可以扩大10％。我们还提出了评估EPW的近似方法，该方法可在没有任何设计信息的情况下使用。我们的结果表明，提出的近似方法可以估计参考EPW面积的80％以上。

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