OPC on a single desktop: A GPU-based OPC and Verification tool for Fabs and Designers

著录项

• 来源
  《Design for manufacturability through design-process integration IV》|2010年|P.764114.1-764114.10|共10页
• 会议地点 San Jose CA(US)
• 作者

  Miami Torunoglu; Ahmet Karakas; Erich Elsen; Curtis Andrus; Brandon Bremen; Pururav Thoutireddy;

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• 作者单位

  Gauda Inc. 3333 Bowers Avenue, Santa Clara, CA, 95054 U.S.A.;

  Gauda Inc. 3333 Bowers Avenue, Santa Clara, CA, 95054 U.S.A.;

  Gauda Inc. 3333 Bowers Avenue, Santa Clara, CA, 95054 U.S.A.;

  Gauda Inc. 3333 Bowers Avenue, Santa Clara, CA, 95054 U.S.A.;

  Gauda Inc. 3333 Bowers Avenue, Santa Clara, CA, 95054 U.S.A.;

  Gauda Inc. 3333 Bowers Avenue, Santa Clara, CA, 95054 U.S.A.;

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• 会议组织
• 原文格式 PDF
• 正文语种 eng
• 中图分类 微电子学、集成电路（IC）;
• 关键词

  optimal proximity correction; verification; graphics processors; computational lithography; full-chip;

  机译：最佳接近校正；验证;图形处理器；计算光刻；全芯片;